Observation of low-temperature elastic softening due to vacancy in crystalline silicon

Terutaka Goto, Hiroshi Yamada-Kaneta, Yasuhiro Saito, Yuichi Nemoto, Koji Sato, Koichi Kakimoto, Shintaro Nakamura

Research output: Contribution to journalArticle

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Abstract

In challenging a direct observation of the vacancy in crystalline silicon, we have carried out low-temperature ultrasonic measurements down to 20 mK. The longitudinal elastic constants of non-doped and B-doped crystalline silicons, which were grown by a floating zone (FZ) method in commercial base, reveal the elastic softening proportional to the reciprocal temperature below 20 K. The applied magnetic fields turn the elastic softening of the B-doped FZ silicon to a temperature-independent behavior, while the fields up to 16 T do not affect the elastic softening of the non-doped FZ silicon. We present a plausible scenario for this result. Namely the vacancy with the non-magnetic charge state V 0 in the non-doped silicon and the magnetic V + in the B-doped silicon is responsible for the low-temperature softening of the shear elastic constants (C 11 - C 12)/2 and C 44, which can be described in terms of the quadrupole susceptibility due to the Jahn-Teller effect.

Original languageEnglish
Article number044602
Journaljournal of the physical society of japan
Volume75
Issue number4
DOIs
Publication statusPublished - Apr 1 2006

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softening
silicon
floating
elastic properties
Jahn-Teller effect
ultrasonics
quadrupoles
shear
magnetic permeability
temperature
magnetic fields

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Observation of low-temperature elastic softening due to vacancy in crystalline silicon. / Goto, Terutaka; Yamada-Kaneta, Hiroshi; Saito, Yasuhiro; Nemoto, Yuichi; Sato, Koji; Kakimoto, Koichi; Nakamura, Shintaro.

In: journal of the physical society of japan, Vol. 75, No. 4, 044602, 01.04.2006.

Research output: Contribution to journalArticle

Goto, Terutaka ; Yamada-Kaneta, Hiroshi ; Saito, Yasuhiro ; Nemoto, Yuichi ; Sato, Koji ; Kakimoto, Koichi ; Nakamura, Shintaro. / Observation of low-temperature elastic softening due to vacancy in crystalline silicon. In: journal of the physical society of japan. 2006 ; Vol. 75, No. 4.
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AU - Goto, Terutaka

AU - Yamada-Kaneta, Hiroshi

AU - Saito, Yasuhiro

AU - Nemoto, Yuichi

AU - Sato, Koji

AU - Kakimoto, Koichi

AU - Nakamura, Shintaro

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