Observation of Si cluster formation in SiO2 films through annealing process using x-ray photoelectron spectroscopy and infrared techniques

Katsuhiko Furukawa, Yichun Liu, Hiroshi Nakashima, Dawei Gao, Kiichiro Uchino, Katsunori Muraoka, Hirohisa Tsuzuki

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29 Citations (Scopus)

Abstract

SiO2 films having high breakdown characteristics were deposited by a sputtering-type electron cyclotron resonance microwave plasma at room temperature. As-deposited films were annealed in an Ar ambient at temperatures ranging from 450 to 1000°C. Transmitted infrared (IR) absorption and x-ray photoelectron spectroscopy (XPS) were used to characterize the as-deposited and annealed films. XPS measurements indicated that the as-deposited films had an approximately stoichiometric composition containing a few intermediate SiOx(x≠2) species and Ar atoms around some dangling-bond defects. The dependence of XPS spectra on annealing temperature showed that steep diffusion of the Ar atoms occurs at annealing temperatures of 450-550°C and the SiOx species separate into SiO2 phase and Si clusters by an annealing process of 750-950°C. Based on the full width at half-maximum variations of Si2p XPS spectra and Si-O stretching mode of IR spectra for the annealed films, we discuss the Si cluster formation in SiO2 films through the annealing process.

Original languageEnglish
Pages (from-to)725-727
Number of pages3
JournalApplied Physics Letters
Volume72
Issue number6
DOIs
Publication statusPublished - Dec 1 1998

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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