Abstract
It is assumed that an interstitial phosphorus atom and a self-interstitial, Pi and I, are of the interstitialcy type. One bond-type migration is applied to their migration. It is concluded that there is essentially no difference between the migrations of a P-I pair, (PI), and Pi by the interstitialcy mechanism and between the chemical processes for the formation-dissociation of (PI) and the kick-out mechanism of Pi.
| Original language | English |
|---|---|
| Pages (from-to) | 6376-6377 |
| Number of pages | 2 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 37 |
| Issue number | 12 |
| Publication status | Published - Dec 1 1998 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)
Cite this
One bond-type migration of phosphorus in silicon by interstitialcy mechanism. / Yoshida, Masayuki; Kamiura, Yoichi; Tsuruno, Reiji; Takahashi, Manabu; Tomokage, Hajime.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 37, No. 12, 01.12.1998, p. 6376-6377.Research output: Contribution to journal › Article
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TY - JOUR
T1 - One bond-type migration of phosphorus in silicon by interstitialcy mechanism
AU - Yoshida, Masayuki
AU - Kamiura, Yoichi
AU - Tsuruno, Reiji
AU - Takahashi, Manabu
AU - Tomokage, Hajime
PY - 1998/12/1
Y1 - 1998/12/1
N2 - It is assumed that an interstitial phosphorus atom and a self-interstitial, Pi and I, are of the interstitialcy type. One bond-type migration is applied to their migration. It is concluded that there is essentially no difference between the migrations of a P-I pair, (PI), and Pi by the interstitialcy mechanism and between the chemical processes for the formation-dissociation of (PI) and the kick-out mechanism of Pi.
AB - It is assumed that an interstitial phosphorus atom and a self-interstitial, Pi and I, are of the interstitialcy type. One bond-type migration is applied to their migration. It is concluded that there is essentially no difference between the migrations of a P-I pair, (PI), and Pi by the interstitialcy mechanism and between the chemical processes for the formation-dissociation of (PI) and the kick-out mechanism of Pi.
UR - http://www.scopus.com/inward/record.url?scp=0032304776&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0032304776&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:0032304776
VL - 37
SP - 6376
EP - 6377
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 12
ER -