One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers

Tomoyasu Hirai, Melvina Leolukman, Chi Chun Liu, Eungnak Han, Yun Jun Kim, Yoshihito Ishida, Teruaki Hayakawa, Masa Aki Kakimoto, Paul F. Nealey, Padma Gopalan

Research output: Contribution to journalArticle

139 Citations (Scopus)

Abstract

(Figure Presented) We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

Original languageEnglish
Pages (from-to)4334-4338
Number of pages5
JournalAdvanced Materials
Volume21
Issue number43
DOIs
Publication statusPublished - Nov 20 2009

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Hirai, T., Leolukman, M., Liu, C. C., Han, E., Kim, Y. J., Ishida, Y., ... Gopalan, P. (2009). One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers. Advanced Materials, 21(43), 4334-4338. https://doi.org/10.1002/adma.200900518