One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers

Tomoyasu Hirai; Melvina Leolukman; Chi Chun Liu; Eungnak Han; Yun Jun Kim; Yoshihito Ishida; Teruaki Hayakawa; Masa Aki Kakimoto; Paul F. Nealey; Padma Gopalan

doi:10.1002/adma.200900518

One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers

Tomoyasu Hirai, Melvina Leolukman, Chi Chun Liu, Eungnak Han, Yun Jun Kim, Yoshihito Ishida, Teruaki Hayakawa, Masa Aki Kakimoto, Paul F. Nealey, Padma Gopalan

Department of Applied Molecular Chemistry

Research output: Contribution to journal › Article › peer-review

147 Citations (Scopus)

Abstract

(Figure Presented) We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

Original language	English
Pages (from-to)	4334-4338
Number of pages	5
Journal	Advanced Materials
Volume	21
Issue number	43
DOIs	https://doi.org/10.1002/adma.200900518
Publication status	Published - Nov 20 2009

All Science Journal Classification (ASJC) codes

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1002/adma.200900518

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One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers. / Hirai, Tomoyasu; Leolukman, Melvina; Liu, Chi Chun; Han, Eungnak; Kim, Yun Jun; Ishida, Yoshihito; Hayakawa, Teruaki; Kakimoto, Masa Aki; Nealey, Paul F.; Gopalan, Padma.

In: Advanced Materials, Vol. 21, No. 43, 20.11.2009, p. 4334-4338.

Research output: Contribution to journal › Article › peer-review

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AU - Leolukman, Melvina

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AU - Han, Eungnak

AU - Kim, Yun Jun

AU - Ishida, Yoshihito

AU - Hayakawa, Teruaki

AU - Kakimoto, Masa Aki

AU - Nealey, Paul F.

AU - Gopalan, Padma

PY - 2009/11/20

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N2 - (Figure Presented) We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

AB - (Figure Presented) We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

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