Optical bandgap energy of Si nanoparticle composite films deposited by a multi-hollow discharge plasma chemical vapor deposition method

Susumu Toko, Yoshinori Kanemitsu, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Semiconductor nanoparticles have significant potential for optoelectronic applications such as solar cells and light-emitting diodes. We are developing semiconductor nanoparticle composite films with a wide bandgap to be used as the window layer of solar cells because the bandgap energy increases with a decrease in the size of particles in the nanometer size range due to the quantum size effect. A multi-hollow discharge plasma chemical vapor deposition (CVD) method was used to fabricate Si nanoparticle composite films and control the volume fraction of nanoparticles in the films. The bandgap energy was increased from 2 eV for a crystalline volume fraction Xc of 0.2 to 2.5 eV for Xc = 0.6 and then decreased to 1.1 eV for Xc = 1. The photo and dark conductivity of films indicate high stability against light soaking. Si nanoparticle composite films with bandgap energies above 2.2 eV are thus promising candidate materials for the window layer of thin-film solar cells.

Original languageEnglish
Pages (from-to)10753-10757
Number of pages5
JournalJournal of nanoscience and nanotechnology
Volume16
Issue number10
DOIs
Publication statusPublished - Oct 1 2016

Fingerprint

Optical band gaps
Composite films
Nanoparticles
plasma jets
Chemical vapor deposition
hollow
Quantum Dots
vapor deposition
Plasmas
Energy gap
nanoparticles
composite materials
solar cells
Light
Volume fraction
Solar cells
Particle Size
energy
Semiconductor materials
soaking

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Optical bandgap energy of Si nanoparticle composite films deposited by a multi-hollow discharge plasma chemical vapor deposition method. / Toko, Susumu; Kanemitsu, Yoshinori; Seo, Hyunwoong; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu.

In: Journal of nanoscience and nanotechnology, Vol. 16, No. 10, 01.10.2016, p. 10753-10757.

Research output: Contribution to journalArticle

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AU - Koga, Kazunori

AU - Shiratani, Masaharu

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