Optimal character-size exploration for increasing throughput of MCC lithographic systems

Makoto Sugihara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)


We propose a character size optimization technique to enhance throughput of multi-column-cell (MCC) lithographic systems in which transistor patterns are projected with multiple column cells in parallel. Each and every column cell is capable of projecting patterns with character projection (CP) and variable shaped beam (VSB) methods. Seeking the optimal character size of characters contributes to minimizing the number of EB shots and reducing the fabrication cost for ICs. Experimental results show that the character size optimization technique reduced 70.6% of EB shots in the best case with an available electron beam size.

Original languageEnglish
Title of host publicationAlternative Lithographic Technologies
Publication statusPublished - Jun 19 2009
EventAlternative Lithographic Technologies - San Jose, CA, United States
Duration: Feb 24 2009Feb 26 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherAlternative Lithographic Technologies
Country/TerritoryUnited States
CitySan Jose, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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