Abstract
We propose a character size optimization technique to enhance throughput of multi-column-cell (MCC) lithographic systems in which transistor patterns are projected with multiple column cells in parallel. Each and every column cell is capable of projecting patterns with character projection (CP) and variable shaped beam (VSB) methods. Seeking the optimal character size of characters contributes to minimizing the number of EB shots and reducing the fabrication cost for ICs. Experimental results show that the character size optimization technique reduced 70.6% of EB shots in the best case with an available electron beam size.
| Original language | English |
|---|---|
| Title of host publication | Alternative Lithographic Technologies |
| DOIs | |
| Publication status | Published - Jun 19 2009 |
| Event | Alternative Lithographic Technologies - San Jose, CA, United States Duration: Feb 24 2009 → Feb 26 2009 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 7271 |
| ISSN (Print) | 0277-786X |
Other
| Other | Alternative Lithographic Technologies |
|---|---|
| Country | United States |
| City | San Jose, CA |
| Period | 2/24/09 → 2/26/09 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
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Cite this
Sugihara, M. (2009). Optimal character-size exploration for increasing throughput of MCC lithographic systems. In Alternative Lithographic Technologies [72710L] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7271). https://doi.org/10.1117/12.813884