Origin of reverse leakage current in n-type nanocrystalline diamond/p-type silicon heterojunction diodes

Tomohiro Ikeda, Kungen Teii

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

The reverse leakage current in n -type nanodiamond film/ p -type silicon wafer heterojunction diodes is examined as a function of the film conductivity. We observe that as the delocalization of carriers in the films becomes stronger, the leakage current becomes larger (from 10-3 to 101 A cm-2). The major leakage source is attributed to the minority carriers from the π defect bands introduced by sp2 carbon. Both a current injection barrier and a dielectric barrier at the interface are found to be small (∼0.6 eV). The simultaneous reduction in leakage current and turn-on voltage for low-loss diodes needs optimization of the interfacial valence band connection.

Original languageEnglish
Article number072104
JournalApplied Physics Letters
Volume94
Issue number7
DOIs
Publication statusPublished - 2009

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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