Overdense Plasma Production Using Electron Cyclotron Waves

Masayoshi Tanaka, Ryuji Nishimoto, Seiichiro Higashi, Nobuhiro Harada, Takeshi Ohi, Akio Komori, Yoshinobu Kawai

    Research output: Contribution to journalArticlepeer-review

    59 Citations (Scopus)


    The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3 x 1013 cm-3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.

    Original languageEnglish
    Pages (from-to)1600-1607
    Number of pages8
    Journaljournal of the physical society of japan
    Issue number5
    Publication statusPublished - May 1991

    All Science Journal Classification (ASJC) codes

    • Physics and Astronomy(all)


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