Oxygen post-annealing effects on critical current properties of PLD-ErBa2Cu3Oy films grown at several substrate temperatures

S. Horii, M. Mukaida, Y. Ichino, K. Matsumoto, T. Ohazama, A. Ichinose, Y. Yoshida, J. Shimoyama, K. Kishio

Research output: Contribution to journalConference articlepeer-review

6 Citations (Scopus)


We report the effects of oxygen post-annealing on critical current properties and normal state resistivities in ErBa2Cu 3Oy/SrTiO3(Er123/STO) thin films fabricated in the substrate temperature range from 720 °C to 780 °C by pulsed laser deposition (PLD). Interestingly, for films fabricated below 760 °C, the critical current density (Jc) increased by oxygen post-annealing process from 0.3-0.6 × 106 A cm-2 to the order of 106 A cm-2 for the as-deposited films despite critical temperatures (Tc) of ∼90 K for both annealed and as-deposited films. In the 780 °C-deposited film, Jc was not obviously enhanced. X-ray diffraction and measurement of normal state resistivities revealed that the PLD-Er123/STO films showed high-quality crystallographic and electrical properties in films deposited below 760 °C. In high temperature resistivity measurements, the resistivity reduced with annealing time and showed a systematic change with changing oxygen partial pressure. These results strongly suggest that oxygen post-annealing is indispensable for improving Jc in 123 films fabricated through a non-equilibrium process such as the PLD method even though the as-deposited films show a Tc value of ∼90 K.

Original languageEnglish
Pages (from-to)1015-1020
Number of pages6
JournalPhysica C: Superconductivity and its applications
Issue numberII
Publication statusPublished - Oct 7 2005
Externally publishedYes
EventProceedings of the 17th Internatioanl Symposium on Superconductivity (ISS 2004) Advances in Superconductivity -
Duration: Nov 23 2004Nov 25 2004

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering


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