Particle behavior and its contribution to film growth in a remote silane plasma

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Abstract

Time-dependent behavior of particles measured using the laser light scattering method in a remote silane plasma has been investigated using both optical emission spectroscopy and quartz crystal microbalance. Laser-scattered particles were observed from 0.3 s after the plasma ignition and scattering increased rapidly until 3.0 s. In the 0-0.3 s region where no particles were observed, SiH and Hβ emission intensity as well as Si/SiH and Hβ/SiH intensity ratios increased rapidly. Laser-scattered particles decreased in number, 3.0 s after plasma discharge, but the deposition rate measured using the quartz crystal microbalance increased linearly. The relationships between time-resolved images of particle movements and their contribution to film deposition as well as plasma characteristics such as SiH and Hβ are presented. The results show that the particles contributing to film growth at the early stage of plasma are much higher in number than those in the stabilized state.

Original languageEnglish
Article number050601
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume36
Issue number5
DOIs
Publication statusPublished - Sep 1 2018

Fingerprint

Silanes
Film growth
silanes
Plasmas
Quartz crystal microbalances
Lasers
quartz crystals
Plasma deposition
microbalances
Optical emission spectroscopy
Deposition rates
Light scattering
lasers
Ignition
optical emission spectroscopy
Scattering
plasma jets
ignition
light scattering
scattering

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{d2964a850a6a45819bf1c5c729accd07,
title = "Particle behavior and its contribution to film growth in a remote silane plasma",
abstract = "Time-dependent behavior of particles measured using the laser light scattering method in a remote silane plasma has been investigated using both optical emission spectroscopy and quartz crystal microbalance. Laser-scattered particles were observed from 0.3 s after the plasma ignition and scattering increased rapidly until 3.0 s. In the 0-0.3 s region where no particles were observed, SiH and Hβ emission intensity as well as Si/SiH and Hβ/SiH intensity ratios increased rapidly. Laser-scattered particles decreased in number, 3.0 s after plasma discharge, but the deposition rate measured using the quartz crystal microbalance increased linearly. The relationships between time-resolved images of particle movements and their contribution to film deposition as well as plasma characteristics such as SiH and Hβ are presented. The results show that the particles contributing to film growth at the early stage of plasma are much higher in number than those in the stabilized state.",
author = "Yeonwon Kim and Kazunori Koga and Masaharu Shiratani",
year = "2018",
month = "9",
day = "1",
doi = "10.1116/1.5037539",
language = "English",
volume = "36",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "5",

}

TY - JOUR

T1 - Particle behavior and its contribution to film growth in a remote silane plasma

AU - Kim, Yeonwon

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2018/9/1

Y1 - 2018/9/1

N2 - Time-dependent behavior of particles measured using the laser light scattering method in a remote silane plasma has been investigated using both optical emission spectroscopy and quartz crystal microbalance. Laser-scattered particles were observed from 0.3 s after the plasma ignition and scattering increased rapidly until 3.0 s. In the 0-0.3 s region where no particles were observed, SiH and Hβ emission intensity as well as Si/SiH and Hβ/SiH intensity ratios increased rapidly. Laser-scattered particles decreased in number, 3.0 s after plasma discharge, but the deposition rate measured using the quartz crystal microbalance increased linearly. The relationships between time-resolved images of particle movements and their contribution to film deposition as well as plasma characteristics such as SiH and Hβ are presented. The results show that the particles contributing to film growth at the early stage of plasma are much higher in number than those in the stabilized state.

AB - Time-dependent behavior of particles measured using the laser light scattering method in a remote silane plasma has been investigated using both optical emission spectroscopy and quartz crystal microbalance. Laser-scattered particles were observed from 0.3 s after the plasma ignition and scattering increased rapidly until 3.0 s. In the 0-0.3 s region where no particles were observed, SiH and Hβ emission intensity as well as Si/SiH and Hβ/SiH intensity ratios increased rapidly. Laser-scattered particles decreased in number, 3.0 s after plasma discharge, but the deposition rate measured using the quartz crystal microbalance increased linearly. The relationships between time-resolved images of particle movements and their contribution to film deposition as well as plasma characteristics such as SiH and Hβ are presented. The results show that the particles contributing to film growth at the early stage of plasma are much higher in number than those in the stabilized state.

UR - http://www.scopus.com/inward/record.url?scp=85052327359&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85052327359&partnerID=8YFLogxK

U2 - 10.1116/1.5037539

DO - 10.1116/1.5037539

M3 - Article

AN - SCOPUS:85052327359

VL - 36

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 5

M1 - 050601

ER -