Pattern formation in a simple model of photochemical reaction

Hidetsugu Sakaguchi, Daishiro Kijima, Shunsuke Chatani, Toshiaki Hattori

    Research output: Contribution to journalArticle

    Abstract

    Stripe and columnar patterns were experimentally found in photopolymer films during irradiation of collimated UV light. We numerically study a similar pattern formation using a simple model of photochemical reaction. Microstuctures are self-organized owing to a new type of instability induced by the coupling between the refraction effect and the photochemical reaction. We perform two- and three-dimensional numerical simulations of model equations, and analyze the self-organized structures using concepts in nonlinear physics such as absolute instability and a soliton. Finally, we propose a more realistic model of photopolymerization. We found a spatially periodic columnar structure with numerical simulation, which is qualitatively similar to the pattern formation in the simple model.

    Original languageEnglish
    Article number124001
    Journaljournal of the physical society of japan
    Volume80
    Issue number12
    DOIs
    Publication statusPublished - Dec 1 2011

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    photochemical reactions
    photopolymers
    refraction
    simulation
    solitary waves
    physics
    irradiation

    All Science Journal Classification (ASJC) codes

    • Physics and Astronomy(all)

    Cite this

    Pattern formation in a simple model of photochemical reaction. / Sakaguchi, Hidetsugu; Kijima, Daishiro; Chatani, Shunsuke; Hattori, Toshiaki.

    In: journal of the physical society of japan, Vol. 80, No. 12, 124001, 01.12.2011.

    Research output: Contribution to journalArticle

    Sakaguchi, Hidetsugu ; Kijima, Daishiro ; Chatani, Shunsuke ; Hattori, Toshiaki. / Pattern formation in a simple model of photochemical reaction. In: journal of the physical society of japan. 2011 ; Vol. 80, No. 12.
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