Abstract
Stripe and columnar patterns were experimentally found in photopolymer films during irradiation of collimated UV light. We numerically study a similar pattern formation using a simple model of photochemical reaction. Microstuctures are self-organized owing to a new type of instability induced by the coupling between the refraction effect and the photochemical reaction. We perform two- and three-dimensional numerical simulations of model equations, and analyze the self-organized structures using concepts in nonlinear physics such as absolute instability and a soliton. Finally, we propose a more realistic model of photopolymerization. We found a spatially periodic columnar structure with numerical simulation, which is qualitatively similar to the pattern formation in the simple model.
| Original language | English |
|---|---|
| Article number | 124001 |
| Journal | journal of the physical society of japan |
| Volume | 80 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - Dec 1 2011 |
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All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
Cite this
Pattern formation in a simple model of photochemical reaction. / Sakaguchi, Hidetsugu; Kijima, Daishiro; Chatani, Shunsuke; Hattori, Toshiaki.
In: journal of the physical society of japan, Vol. 80, No. 12, 124001, 01.12.2011.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Pattern formation in a simple model of photochemical reaction
AU - Sakaguchi, Hidetsugu
AU - Kijima, Daishiro
AU - Chatani, Shunsuke
AU - Hattori, Toshiaki
PY - 2011/12/1
Y1 - 2011/12/1
N2 - Stripe and columnar patterns were experimentally found in photopolymer films during irradiation of collimated UV light. We numerically study a similar pattern formation using a simple model of photochemical reaction. Microstuctures are self-organized owing to a new type of instability induced by the coupling between the refraction effect and the photochemical reaction. We perform two- and three-dimensional numerical simulations of model equations, and analyze the self-organized structures using concepts in nonlinear physics such as absolute instability and a soliton. Finally, we propose a more realistic model of photopolymerization. We found a spatially periodic columnar structure with numerical simulation, which is qualitatively similar to the pattern formation in the simple model.
AB - Stripe and columnar patterns were experimentally found in photopolymer films during irradiation of collimated UV light. We numerically study a similar pattern formation using a simple model of photochemical reaction. Microstuctures are self-organized owing to a new type of instability induced by the coupling between the refraction effect and the photochemical reaction. We perform two- and three-dimensional numerical simulations of model equations, and analyze the self-organized structures using concepts in nonlinear physics such as absolute instability and a soliton. Finally, we propose a more realistic model of photopolymerization. We found a spatially periodic columnar structure with numerical simulation, which is qualitatively similar to the pattern formation in the simple model.
UR - http://www.scopus.com/inward/record.url?scp=82955236250&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=82955236250&partnerID=8YFLogxK
U2 - 10.1143/JPSJ.80.124001
DO - 10.1143/JPSJ.80.124001
M3 - Article
AN - SCOPUS:82955236250
VL - 80
JO - Journal of the Physical Society of Japan
JF - Journal of the Physical Society of Japan
SN - 0031-9015
IS - 12
M1 - 124001
ER -