Performance enhancement of 60 GHz CMOS band pass filter employing oxide height virtual increase

Nessim Mahmoud, Adel Barakat, Mohamed E. Nasr, Ramesh K. Pokharel

Research output: Contribution to journalArticlepeer-review

Abstract

A high selectivity compact size coupled open-loop resonator (OLR-) band pass filter (BPF) in 0.18 µm TSMC Complementary Metal Oxide Semiconductor (CMOS) with low insertion (IL) is presented in this manuscript. First, shape optimization and folding are used to guarantee compact size. Then, high performance of the proposed BPF is obtained by virtually increasing the height of the oxide between the OLR’s traces and their ground plane. This virtual increase in the oxide height is realized by etching large slot areas below each of the OLRs. Consequently, the traces are characterized by wider width which in return exhibit lower attenuation constant and hence lower IL. The simulated and measured responses have a very good agreement. The fabricated BPF shows an IL of 3.5 dB at 59 GHz with a return loss of 15 dB and a fractional bandwidth of 16.5%. The fabricated chip has an area of 378 × 430 µm 2 including the measurements pads.

Original languageEnglish
Pages (from-to)125-134
Number of pages10
JournalProgress In Electromagnetics Research M
Volume77
DOIs
Publication statusPublished - 2019

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Performance enhancement of 60 GHz CMOS band pass filter employing oxide height virtual increase'. Together they form a unique fingerprint.

Cite this