Performance improvement of a discharge-pumped ArF excimer laser by xenon gas addition

Naoki Kataoka, Motoya Itagaki, Kiichiro Uchino, Katsunori Muraoka, Akihiko Takahashi, Tatsuo Okada, Mitsuo Maeda, Tsukasa Hori, Katsutomo Terashima, Akira Sumitani, Tatsuo Enami, Hakaru Mizoguchi

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The effect of xenon (Xe) gas addition to a discharge-pumped ArF excimer laser was examined. When the partial pressure of the Xe gas was changed over a wide range, the output energy of the ArF excimer laser was found to become maximum at the Xe partial pressure of 20mTorr and to be about three times higher than that without Xe addition. It was shown that Xe gas addition was effective in increasing the initial electron density which was produced in the preionization process, and that the increase of the initial electron density then produced a tendency to make the main discharge in the laser uniform in the direction of the optical axis.

Original languageEnglish
Pages (from-to)6735-6738
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number12 A
DOIs
Publication statusPublished - Dec 1 1999

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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