Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering

Makoto Arita, H Sakamoto, Y Tabata, Yoshifumi Ikoma, Masataka Masuda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationProceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies”
Pages32-35
Publication statusPublished - Mar 2011

Cite this

Arita, M., Sakamoto, H., Tabata, Y., Ikoma, Y., & Masuda, M. (2011). Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering. In Proceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies” (pp. 32-35)

Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering. / Arita, Makoto; Sakamoto, H; Tabata, Y; Ikoma, Yoshifumi; Masuda, Masataka.

Proceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies”. 2011. p. 32-35.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Arita, M, Sakamoto, H, Tabata, Y, Ikoma, Y & Masuda, M 2011, Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering. in Proceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies”. pp. 32-35.
Arita M, Sakamoto H, Tabata Y, Ikoma Y, Masuda M. Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering. In Proceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies”. 2011. p. 32-35
Arita, Makoto ; Sakamoto, H ; Tabata, Y ; Ikoma, Yoshifumi ; Masuda, Masataka. / Photo-electrochemical properties of photocatalytic titanium dioxide films prepared by RF magnetron sputtering. Proceedings of International colloquium on “Recent progress in nanofabrications of MEMS and NEMS: Science and innovation technologies”. 2011. pp. 32-35
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