Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method

Makoto Arita, Yu Tabata, Hiroki Sakamoto, Qixin Guo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The photo-electrochemical properties of photocatalytic titanium dioxide thin filmsobtained by reactive RF magnetron sputtering were investigated. The pressure during the sputteringdeposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa thehighest activities were observed. The photocurrent under ultraviolet light illumination corresponded tothe photo-induced activities of the films. It is suggested that the band bending near the surface is oneof the most crucial factors determines the activities of photo-induced behavior of the titanium dioxidethin films.

Original languageEnglish
Title of host publicationAdvanced Materials Science and Technology
PublisherTrans Tech Publications Ltd
Pages248-251
Number of pages4
ISBN (Print)9783037856604
DOIs
Publication statusPublished - 2013
Event8th International Forum on Advanced Materials Science and Technology, IFAMST 2012 - Fukuoka City, Japan
Duration: Aug 1 2012Aug 4 2012

Publication series

NameMaterials Science Forum
Volume750
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Other

Other8th International Forum on Advanced Materials Science and Technology, IFAMST 2012
CountryJapan
CityFukuoka City
Period8/1/128/4/12

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Arita, M., Tabata, Y., Sakamoto, H., & Guo, Q. (2013). Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method. In Advanced Materials Science and Technology (pp. 248-251). (Materials Science Forum; Vol. 750). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/MSF.750.248