Photoelectrochemical properties of a well-structured 1.3 nm-thick pn junction crystal

Keisuke Awaya, Akihide Takashiba, Takaaki Taniguchi, Michio Koinuma, Tatsumi Ishihara, Shintaro Ida

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A 1.3 nm-thick nickel hydroxide (p-type, 0.5 nm)/titania (n-type, 0.8 nm) pn junction prepared by lamination of nanosheets improved the onset potential for photoelectrochemical oxidation and increased the photooxidation current, indicating that ultrathin pn junctions suppress the recombination of photo-generated carriers.

Original languageEnglish
Pages (from-to)4586-4588
Number of pages3
JournalChemical Communications
Volume55
Issue number31
DOIs
Publication statusPublished - Jan 1 2019

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Photoelectrochemical properties of a well-structured 1.3 nm-thick pn junction crystal'. Together they form a unique fingerprint.

  • Cite this