Photolithography system with liquid crystal display as active gray-tone mask for 3D structuring of photoresist

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Layer manufacturing is generally utilized for the development of micro electromechanical systems (MEMS) and micro total analysis systems (μTAS). However, the preparation of multiple masks and repetitive exposure procedure prevents the rapid fabrication of 3D microstructures. An active mask fabrication by using a liquid crystal display (LCD) as an electrically controllable photomask can simplify the layer manufacturing process. In addition, the gray-tone photolithography is available by using LCD lithography system, since the exposure distribution is easily controlled by an LCD. We have developed the LCD mask exposure system by using UV light source. Firstly, the patterning characteristics of the UV photoresist by exposing line and space patterns are evaluated, and then, a fundamental step shape is produced in order to verify the feasibility of gray-tone UV photolithography by using LCD. A shape with a different height can be fabricated without any repetitive exposure and development procedures. Finally, we confirmed the high patterning resolution such as 11 μm using check patterns and fabricated 3D step shapes by using the LCD as a gray-scale photomask.

Original languageEnglish
Pages (from-to)381-388
Number of pages8
JournalSensors and Actuators, A: Physical
Volume144
Issue number2
DOIs
Publication statusPublished - Jun 15 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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