Photoluminescent iron disilicide on modified Si surface by using silver

Kensuke Akiyama, Shinichi Motomura, Masaru Itakura, Yasuhiro Naganuma, Hiroshi Funakubo

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Pronounced enhancement of photoluminescence (PL) intensity was observed from β-FeSi2 by using metal-organic chemical vapor deposition (MOCVD) on (100) Si substrates coated with a silver (Ag) layer. X-ray diffraction analysis revealed modifications to the crystal structure near the surface of Si, where the in-plane lattice parameter had been elongated, by Ag atomic diffusion from the surface to inside the Si during the heating process before deposition. This modified Si surface contributed to decreasing the non-radiative recombination centers at the β-FeSi2/Si interface and in the β-FeSi2 film, which led to the pronounced enhancement of PL intensity.

Original languageEnglish
Article number07JB04
JournalJapanese Journal of Applied Physics
Volume54
Issue number7
DOIs
Publication statusPublished - Jan 1 2015

Fingerprint

Silver
silver
Iron
iron
Photoluminescence
photoluminescence
Industrial heating
augmentation
Organic chemicals
X ray diffraction analysis
Lattice constants
metalorganic chemical vapor deposition
Chemical vapor deposition
lattice parameters
Crystal structure
crystal structure
heating
Substrates
Metals
diffraction

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Photoluminescent iron disilicide on modified Si surface by using silver. / Akiyama, Kensuke; Motomura, Shinichi; Itakura, Masaru; Naganuma, Yasuhiro; Funakubo, Hiroshi.

In: Japanese Journal of Applied Physics, Vol. 54, No. 7, 07JB04, 01.01.2015.

Research output: Contribution to journalArticle

Akiyama, Kensuke ; Motomura, Shinichi ; Itakura, Masaru ; Naganuma, Yasuhiro ; Funakubo, Hiroshi. / Photoluminescent iron disilicide on modified Si surface by using silver. In: Japanese Journal of Applied Physics. 2015 ; Vol. 54, No. 7.
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