TY - JOUR
T1 - Photoluminescent iron disilicide on modified Si surface by using silver
AU - Akiyama, Kensuke
AU - Motomura, Shinichi
AU - Itakura, Masaru
AU - Naganuma, Yasuhiro
AU - Funakubo, Hiroshi
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
Copyright:
Copyright 2015 Elsevier B.V., All rights reserved.
PY - 2015/7/1
Y1 - 2015/7/1
N2 - Pronounced enhancement of photoluminescence (PL) intensity was observed from β-FeSi2 by using metal-organic chemical vapor deposition (MOCVD) on (100) Si substrates coated with a silver (Ag) layer. X-ray diffraction analysis revealed modifications to the crystal structure near the surface of Si, where the in-plane lattice parameter had been elongated, by Ag atomic diffusion from the surface to inside the Si during the heating process before deposition. This modified Si surface contributed to decreasing the non-radiative recombination centers at the β-FeSi2/Si interface and in the β-FeSi2 film, which led to the pronounced enhancement of PL intensity.
AB - Pronounced enhancement of photoluminescence (PL) intensity was observed from β-FeSi2 by using metal-organic chemical vapor deposition (MOCVD) on (100) Si substrates coated with a silver (Ag) layer. X-ray diffraction analysis revealed modifications to the crystal structure near the surface of Si, where the in-plane lattice parameter had been elongated, by Ag atomic diffusion from the surface to inside the Si during the heating process before deposition. This modified Si surface contributed to decreasing the non-radiative recombination centers at the β-FeSi2/Si interface and in the β-FeSi2 film, which led to the pronounced enhancement of PL intensity.
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U2 - 10.7567/JJAP.54.07JB04
DO - 10.7567/JJAP.54.07JB04
M3 - Article
AN - SCOPUS:84936763914
SN - 0021-4922
VL - 54
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 7
M1 - 07JB04
ER -