Physical properties of fe3si films coated through facing targets sputtering after microwave plasma treatment

Nattakorn Borwornpornmetee, Peerasil Charoenyuenyao, Rawiwan Chaleawpong, Boonchoat Paosawatyanyong, Rungrueang Phatthanakun, Phongsaphak Sittimart, Kazuki Aramaki, Takeru Hamasaki, Tsuyoshi Yoshitake, Nathaporn Promros

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2 Citations (Scopus)

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