Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source

Hong Jie Jin, Masaharu Shiratani, Takashi Kawasaki, Tsuyoshi Fukuzawa, Toshio Kinoshita, Yukio Watanabe, Hiroharu Kawasaki, Masaharu Toyofuku

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds