Plasma etching of single fine particle trapped in Ar plasma by optical tweezers

T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, M. Shiratani

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)

Abstract

Physical and chemical interactions between plasmas and nano-featured surfaces are one important issue in the plasma processing. Here we optically trap single fine particle levitated at plasma/sheath boundary with an infrared laser to realize in-situ analysis of such interactions. We have measured time evolution of the diameter of the single fine particle in Ar plasma. The trapped particle was etched at an etching rate of 1 nm/min in Ar plasma. We also obtained a Raman peak at around 2950 cm-1 corresponding to C-H bonds in the single fine particle in Ar plasma. The results open a new possibility to observe directly interactions between plasma and single fine particle.

Original languageEnglish
Article number012014
JournalJournal of Physics: Conference Series
Volume518
Issue number1
DOIs
Publication statusPublished - 2014
Event26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, Japan
Duration: Sep 23 2013Sep 24 2013

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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