Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas

Satoshi Kitazaki, Thapanut Sarinont, Kazunori Koga, Nobuya Hayashi, Masaharu Shiratani

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

Combinatorial analysis has been carried out to investigate the long-term effects of plasma irradiation of radish seeds on the subsequent sprout growth (Raphanus sativus L.) using atmospheric dielectric barrier discharge plasmas in air. The average seedling length was maximized with 180 s of plasma irradiation when the seed was 5 mm from the electrode edge and 3 mm below the electrode. With these parameters the average seedling length was 250% longer than that not irradiated after three days of cultivation. Observation of the seeds using an infrared (IR) camera and scanning electron microscopy revealed that the temperature rise and etching of the seeds during the plasma irradiation have little effect on growth enhancement. The interaction between radicals and seeds for a duration of 180 s leads to the growth enhancement of radish sprouts for 7 days.

Original languageEnglish
JournalCurrent Applied Physics
Volume14
Issue numberSUPPL. 2
DOIs
Publication statusPublished - Jul 24 2014

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Discharge (fluid mechanics)
plasma jets
Seed
seeds
Plasmas
augmentation
air
Air
Irradiation
irradiation
combinatorial analysis
long term effects
Electrodes
electrodes
Etching
Cameras
cameras
etching
Infrared radiation
Scanning electron microscopy

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)

Cite this

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title = "Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas",
abstract = "Combinatorial analysis has been carried out to investigate the long-term effects of plasma irradiation of radish seeds on the subsequent sprout growth (Raphanus sativus L.) using atmospheric dielectric barrier discharge plasmas in air. The average seedling length was maximized with 180 s of plasma irradiation when the seed was 5 mm from the electrode edge and 3 mm below the electrode. With these parameters the average seedling length was 250{\%} longer than that not irradiated after three days of cultivation. Observation of the seeds using an infrared (IR) camera and scanning electron microscopy revealed that the temperature rise and etching of the seeds during the plasma irradiation have little effect on growth enhancement. The interaction between radicals and seeds for a duration of 180 s leads to the growth enhancement of radish sprouts for 7 days.",
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AU - Kitazaki, Satoshi

AU - Sarinont, Thapanut

AU - Koga, Kazunori

AU - Hayashi, Nobuya

AU - Shiratani, Masaharu

PY - 2014/7/24

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N2 - Combinatorial analysis has been carried out to investigate the long-term effects of plasma irradiation of radish seeds on the subsequent sprout growth (Raphanus sativus L.) using atmospheric dielectric barrier discharge plasmas in air. The average seedling length was maximized with 180 s of plasma irradiation when the seed was 5 mm from the electrode edge and 3 mm below the electrode. With these parameters the average seedling length was 250% longer than that not irradiated after three days of cultivation. Observation of the seeds using an infrared (IR) camera and scanning electron microscopy revealed that the temperature rise and etching of the seeds during the plasma irradiation have little effect on growth enhancement. The interaction between radicals and seeds for a duration of 180 s leads to the growth enhancement of radish sprouts for 7 days.

AB - Combinatorial analysis has been carried out to investigate the long-term effects of plasma irradiation of radish seeds on the subsequent sprout growth (Raphanus sativus L.) using atmospheric dielectric barrier discharge plasmas in air. The average seedling length was maximized with 180 s of plasma irradiation when the seed was 5 mm from the electrode edge and 3 mm below the electrode. With these parameters the average seedling length was 250% longer than that not irradiated after three days of cultivation. Observation of the seeds using an infrared (IR) camera and scanning electron microscopy revealed that the temperature rise and etching of the seeds during the plasma irradiation have little effect on growth enhancement. The interaction between radicals and seeds for a duration of 180 s leads to the growth enhancement of radish sprouts for 7 days.

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