Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system

K. Imasaka, Koji Takahashi, Junya Suehiro, M. Hara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft x-rays. Gas-puff z-pinch is expected to industrial applications such as soft x-ray lithography, microscopy and laser. In these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft x-ray. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using an IPP (Inductive Pulsed Power) system. In this paper, the voltage polarity effects on the gaspuff z-pinch plasma behavior, spatial distribution of hot spots and soft x-ray emission are described.

Original languageEnglish
Title of host publicationPPPS 2001 - Pulsed Power Plasma Science 2001
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages757-760
Number of pages4
Volume1
ISBN (Electronic)0780371208, 9780780371200
DOIs
Publication statusPublished - Jan 1 2015
Event28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, United States
Duration: Jun 17 2001Jun 22 2001

Other

Other28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
CountryUnited States
CityLas Vegas
Period6/17/016/22/01

Fingerprint

plasma pinch
polarity
Plasmas
X rays
Gases
gases
x rays
Plasma density
Electric potential
electric potential
Lithography
Spatial distribution
point sources
shot
Industrial applications
Microscopic examination
spatial distribution
lithography
flux density
Scattering

All Science Journal Classification (ASJC) codes

  • Energy Engineering and Power Technology
  • Nuclear Energy and Engineering
  • Nuclear and High Energy Physics

Cite this

Imasaka, K., Takahashi, K., Suehiro, J., & Hara, M. (2015). Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. In PPPS 2001 - Pulsed Power Plasma Science 2001 (Vol. 1, pp. 757-760). [1002207] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.01002207

Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. / Imasaka, K.; Takahashi, Koji; Suehiro, Junya; Hara, M.

PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2015. p. 757-760 1002207.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Imasaka, K, Takahashi, K, Suehiro, J & Hara, M 2015, Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. in PPPS 2001 - Pulsed Power Plasma Science 2001. vol. 1, 1002207, Institute of Electrical and Electronics Engineers Inc., pp. 757-760, 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001, Las Vegas, United States, 6/17/01. https://doi.org/10.1109/PPPS.2001.01002207
Imasaka K, Takahashi K, Suehiro J, Hara M. Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. In PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 1. Institute of Electrical and Electronics Engineers Inc. 2015. p. 757-760. 1002207 https://doi.org/10.1109/PPPS.2001.01002207
Imasaka, K. ; Takahashi, Koji ; Suehiro, Junya ; Hara, M. / Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2015. pp. 757-760
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