Polishing characteristics of glass substrate using new atmosphere control sealed CMP machine (Bell-jar shaped CMP machine) - Effect of Bell-jar processing that aims at reduce of amount of CeO2 slurry use

Tsutomu Yamazaki, Toshiro K. Doi, Syuhei Kurokawa, Osamu Ohnishi, Michio Uneda, Yoji Umezaki, Tao Yin, Hideo Aida

Research output: Contribution to journalArticle

Abstract

Aiming to achieve highly effective polishing in the super-precision polishing of the glass substrate using for HDD, we have conducted a research examining polishing characteristics of the glass substrate cerium oxide and manganese oxide slurries, and a newly devised atmosphere control sealed CMP machine (Bell-jar shaped CMP chamber). Polishing experiment was carried in a radical environment by making the polishing chamber vacuum, or highly pressurized charging various gases inside. Polishing rates varied as the polishing environment varied. When compared with the conventional CMP, the polishing rate increased from 1.5 to 2.0 times. The above result suggests the effectiveness of the glass polishing in the pressurized chamber utilizing the atmosphere control sealed CMP machine. Furthermore this allows the polishing time shortened, leading to the reduction of slurry consumption.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalSeimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume78
Issue number2
DOIs
Publication statusPublished - Jan 1 2012

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Polishing characteristics of glass substrate using new atmosphere control sealed CMP machine (Bell-jar shaped CMP machine) - Effect of Bell-jar processing that aims at reduce of amount of CeO<sub>2</sub> slurry use'. Together they form a unique fingerprint.

  • Cite this