Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers

Keita Kuroda, Hiromi Miyoshi, Shota Fujii, Tomoyasu Hirai, Atsushi Takahara, Aiko Nakao, Yasuhiko Iwasaki, Kenichi Morigaki, Kazuhiko Ishihara, Shin Ichi Yusa

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Poly(2-methacryloyloxyethyl phosphorylcholine) (PMPC) possesses protein antifouling properties. Diblock copolymers (PMPC120-b-P(TSM/CEAx)y) composed of a PMPC block and random copolymer block with 3-(tris(trimethylsiloxy)silyl)propyl methacrylate (TSM) and 2-cinnamoylethyl acrylate (CEA) were prepared via reversible addition-fragmentation chain transfer (RAFT) radical polymerization. A thin film of PMPC120-P(TSM/CEAx)y formed on the surface of the poly(dimethylsiloxane) (PDMS) substrate due to physical adsorption of the TSM units to poly(dimethylsiloxane) (PDMS) and photo-crosslinking of the CEA units. A lattice pattern of PMPC120-P(TSM/CEAx)y on the PDMS surface was prepared using UV irradiation through a photomask. PMPC120-P(TSM/CEAx)y-coated PDMS demonstrated protein antifouling activity. Cell patterning could be achieved by culturing on the PMPC-patterned PDMS substrate.

Original languageEnglish
Pages (from-to)46686-46693
Number of pages8
JournalRSC Advances
Volume5
Issue number58
DOIs
Publication statusPublished - Jan 1 2015

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)

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