Polymer-confined colloidal monolayer: A reusable soft photomask for rapid wafer-scale nanopatterning

Ming Fang, Hao Lin, Ho Yuen Cheung, Fei Xiu, Lifan Shen, Senpo Yip, Edwin Yue Bun Pun, Chun Yuen Wong, Johnny C. Ho

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)


We demonstrate the repeated utilization of self-Assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.

Original languageEnglish
Pages (from-to)20837-20841
Number of pages5
JournalACS Applied Materials and Interfaces
Issue number23
Publication statusPublished - Dec 10 2014
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Materials Science(all)


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