Possibility of high deposition rate in SmBa2Cu3O y, films prepared using the vapor-liquid-solid growth mode

Yusuke Ichino; Hisayoshi Matsuo; Yutaka Yoshida; Yoshiaki Tarai; Kaname Matsumoto; Masashi Mukaida; Ataru Ichinose; Shigeru Horii

doi:10.1143/JJAP.45.758

Possibility of high deposition rate in SmBa₂Cu₃O _y, films prepared using the vapor-liquid-solid growth mode

Yusuke Ichino, Hisayoshi Matsuo, Yutaka Yoshida, Yoshiaki Tarai, Kaname Matsumoto, Masashi Mukaida, Ataru Ichinose, Shigeru Horii

Advanced Materials Physics

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

The vapor-liquid-solid (VLS) growth mode is expected to achieve high-quality REBa₂Cu₂O_y thin films at a high growth rate since it is almost identical to the liquid phase epitaxy (LPE) growth mode. We studied the effect of the deposition rate on superconductivity in SmBa₂Cu₃O_y (Sm123) thin films prepared using the VLS growth mode. The VLS-Sm123 films as well as that deposited by pulsed laser deposition (PLD) under optimal conditions had completely c-axis orientation and maintained high crystallinity. Critical temperatures were around 90 K and independent of the deposition rate. However, critical current densities increased with the deposition rate and reached over 1 MA/cm ² at 77 K. In this study, a maximum deposition rate of 320nm/min was achieved; this was thirty times as high as that obtained by PLD. We propose that a deposition rate as high as that obtained by LPE can be achieved by the VLS growth mode.

Original language	English
Pages (from-to)	758-760
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	45
Issue number	2 A
DOIs	https://doi.org/10.1143/JJAP.45.758
Publication status	Published - Feb 8 2006

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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Possibility of high deposition rate in SmBa₂Cu₃O _y, films prepared using the vapor-liquid-solid growth mode. / Ichino, Yusuke; Matsuo, Hisayoshi; Yoshida, Yutaka; Tarai, Yoshiaki; Matsumoto, Kaname; Mukaida, Masashi; Ichinose, Ataru; Horii, Shigeru.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 45, No. 2 A, 08.02.2006, p. 758-760.

Research output: Contribution to journal › Article › peer-review

Ichino, Y, Matsuo, H, Yoshida, Y, Tarai, Y, Matsumoto, K, Mukaida, M, Ichinose, A & Horii, S 2006, 'Possibility of high deposition rate in SmBa₂Cu₃O _y, films prepared using the vapor-liquid-solid growth mode', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 45, no. 2 A, pp. 758-760. https://doi.org/10.1143/JJAP.45.758

Ichino, Yusuke ; Matsuo, Hisayoshi ; Yoshida, Yutaka ; Tarai, Yoshiaki ; Matsumoto, Kaname ; Mukaida, Masashi ; Ichinose, Ataru ; Horii, Shigeru. / Possibility of high deposition rate in SmBa₂Cu₃O _y, films prepared using the vapor-liquid-solid growth mode. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2006 ; Vol. 45, No. 2 A. pp. 758-760.

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abstract = "The vapor-liquid-solid (VLS) growth mode is expected to achieve high-quality REBa2Cu2Oy thin films at a high growth rate since it is almost identical to the liquid phase epitaxy (LPE) growth mode. We studied the effect of the deposition rate on superconductivity in SmBa2Cu3Oy (Sm123) thin films prepared using the VLS growth mode. The VLS-Sm123 films as well as that deposited by pulsed laser deposition (PLD) under optimal conditions had completely c-axis orientation and maintained high crystallinity. Critical temperatures were around 90 K and independent of the deposition rate. However, critical current densities increased with the deposition rate and reached over 1 MA/cm 2 at 77 K. In this study, a maximum deposition rate of 320nm/min was achieved; this was thirty times as high as that obtained by PLD. We propose that a deposition rate as high as that obtained by LPE can be achieved by the VLS growth mode.",

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AU - Matsumoto, Kaname

AU - Mukaida, Masashi

AU - Ichinose, Ataru

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