Potential profile measurements on compact helical system (CHS) using a 200 keV heavy ion beam probe

akihide fujisawa, H. Iguchi, S. Lee, T. P. Crowley, Y. Hamada, S. Hidekuma, M. Kojima, S. Kubo, Hiroshi Idei, K. Nishimura, S. Okamura, K. Matsuoka

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A 200 keV heavy ion beam probe system has been prepared to measure potential profiles in the compact helical system. Probing beam trajectory is successfully controlled by a secondary beam sweep system to keep the injection angle of the secondary beam constant during the radial scan. As a result, it was observed that the potential profile changes after the neutral beam heating is applied on electron cyclotron heated plasmas.

Original languageEnglish
Pages (from-to)649-651
Number of pages3
JournalFusion Engineering and Design
Volume34-35
DOIs
Publication statusPublished - Jan 1 1997
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Civil and Structural Engineering
  • Nuclear Energy and Engineering
  • Materials Science(all)
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Potential profile measurements on compact helical system (CHS) using a 200 keV heavy ion beam probe'. Together they form a unique fingerprint.

Cite this