Precipitate resolution in an electron irradiated ni-si alloy

Hideo Watanabe, T. Muroga, N. Yoshida, K. Kitajima

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Precipitate resolution processes in a Ni-12.6 at% Si alloy under electron irradiation have been observed by means of HVEM. Above 400°C, growth and resolution of Ni3Si precipitates were observed simultaneously. The detail stereoscopic observation showed that the precipitates close to free surfaces grew, while those in the middle of a specimen dissolved. The critical dose when the precipitates start to shrink increases with increasing the depth. This depth dependence of the precipitate behavior under irradiation has a close relation with the formation of surface precipitates and the growth of solute depleted zone beneath them. The temperature and dose dependence of the resolution rate showed that the precipitates in the solute depleted zone dissolved by the interface controlled process of radiation-enhanced diffusion.

Original languageEnglish
Pages (from-to)179-187
Number of pages9
JournalJournal of Nuclear Materials
Volume158
Issue numberC
DOIs
Publication statusPublished - Jan 1 1988

Fingerprint

Precipitates
precipitates
Electrons
electrons
solutes
dosage
Electron irradiation
electron irradiation
Irradiation
Radiation
temperature dependence
irradiation
radiation
Temperature

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

Cite this

Precipitate resolution in an electron irradiated ni-si alloy. / Watanabe, Hideo; Muroga, T.; Yoshida, N.; Kitajima, K.

In: Journal of Nuclear Materials, Vol. 158, No. C, 01.01.1988, p. 179-187.

Research output: Contribution to journalArticle

Watanabe, Hideo ; Muroga, T. ; Yoshida, N. ; Kitajima, K. / Precipitate resolution in an electron irradiated ni-si alloy. In: Journal of Nuclear Materials. 1988 ; Vol. 158, No. C. pp. 179-187.
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