Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

Takamichi Shinohara, Tomoko Shirahase, Daiki Murakami, Taiki Hoshino, Moriya Kikuchi, Jun Ichiro Koike, Misao Horigome, Hiroyasu Masunaga, Hiroki Ogawa, Atsushi Takahara

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

Original languageEnglish
Pages (from-to)307-312
Number of pages6
JournalPolymer Journal
Volume45
Issue number3
DOIs
Publication statusPublished - Mar 1 2013

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Synchrotron radiation
X ray scattering
Polymer films
Nanoimprint lithography
Nanostructures
Surface structure
Thin films
Electrooptical devices
Polystyrenes
Lactic acid
Diffraction patterns
Scattering

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering. / Shinohara, Takamichi; Shirahase, Tomoko; Murakami, Daiki; Hoshino, Taiki; Kikuchi, Moriya; Koike, Jun Ichiro; Horigome, Misao; Masunaga, Hiroyasu; Ogawa, Hiroki; Takahara, Atsushi.

In: Polymer Journal, Vol. 45, No. 3, 01.03.2013, p. 307-312.

Research output: Contribution to journalArticle

Shinohara, Takamichi ; Shirahase, Tomoko ; Murakami, Daiki ; Hoshino, Taiki ; Kikuchi, Moriya ; Koike, Jun Ichiro ; Horigome, Misao ; Masunaga, Hiroyasu ; Ogawa, Hiroki ; Takahara, Atsushi. / Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering. In: Polymer Journal. 2013 ; Vol. 45, No. 3. pp. 307-312.
@article{b5b8977718004721a9fed2e2e6766dc5,
title = "Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering",
abstract = "Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.",
author = "Takamichi Shinohara and Tomoko Shirahase and Daiki Murakami and Taiki Hoshino and Moriya Kikuchi and Koike, {Jun Ichiro} and Misao Horigome and Hiroyasu Masunaga and Hiroki Ogawa and Atsushi Takahara",
year = "2013",
month = "3",
day = "1",
doi = "10.1038/pj.2012.133",
language = "English",
volume = "45",
pages = "307--312",
journal = "Polymer Journal",
issn = "0032-3896",
publisher = "Nature Publishing Group",
number = "3",

}

TY - JOUR

T1 - Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

AU - Shinohara, Takamichi

AU - Shirahase, Tomoko

AU - Murakami, Daiki

AU - Hoshino, Taiki

AU - Kikuchi, Moriya

AU - Koike, Jun Ichiro

AU - Horigome, Misao

AU - Masunaga, Hiroyasu

AU - Ogawa, Hiroki

AU - Takahara, Atsushi

PY - 2013/3/1

Y1 - 2013/3/1

N2 - Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

AB - Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

UR - http://www.scopus.com/inward/record.url?scp=84874610906&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84874610906&partnerID=8YFLogxK

U2 - 10.1038/pj.2012.133

DO - 10.1038/pj.2012.133

M3 - Article

AN - SCOPUS:84874610906

VL - 45

SP - 307

EP - 312

JO - Polymer Journal

JF - Polymer Journal

SN - 0032-3896

IS - 3

ER -