Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

Takamichi Shinohara; Tomoko Shirahase; Daiki Murakami; Taiki Hoshino; Moriya Kikuchi; Jun Ichiro Koike; Misao Horigome; Hiroyasu Masunaga; Hiroki Ogawa; Atsushi Takahara

doi:10.1038/pj.2012.133

Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

Takamichi Shinohara, Tomoko Shirahase, Daiki Murakami, Taiki Hoshino, Moriya Kikuchi, Jun Ichiro Koike, Misao Horigome, Hiroyasu Masunaga, Hiroki Ogawa, Atsushi Takahara

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3 Citations (Scopus)

Abstract

Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

Original language	English
Pages (from-to)	307-312
Number of pages	6
Journal	Polymer Journal
Volume	45
Issue number	3
DOIs	https://doi.org/10.1038/pj.2012.133
Publication status	Published - Mar 2013

All Science Journal Classification (ASJC) codes

Polymers and Plastics
Materials Chemistry

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10.1038/pj.2012.133

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Shinohara, T., Shirahase, T., Murakami, D., Hoshino, T., Kikuchi, M., Koike, J. I., Horigome, M., Masunaga, H., Ogawa, H., & Takahara, A. (2013). Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering. Polymer Journal, 45(3), 307-312. https://doi.org/10.1038/pj.2012.133

Shinohara, T, Shirahase, T, Murakami, D, Hoshino, T, Kikuchi, M, Koike, JI, Horigome, M, Masunaga, H, Ogawa, H & Takahara, A 2013, 'Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering', Polymer Journal, vol. 45, no. 3, pp. 307-312. https://doi.org/10.1038/pj.2012.133

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title = "Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering",

abstract = "Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.",

author = "Takamichi Shinohara and Tomoko Shirahase and Daiki Murakami and Taiki Hoshino and Moriya Kikuchi and Koike, {Jun Ichiro} and Misao Horigome and Hiroyasu Masunaga and Hiroki Ogawa and Atsushi Takahara",

note = "Funding Information: The synchrotron radiation SAXS measurements were performed at SPring-8 with the approval of the Japan Synchrotron Radiation Institute (JASRI, proposal number 2010A7241). The present work is supported by a grant-in-aid for the Global COE Program, {\textquoteleft}Science for Future Molecular Systems{\textquoteright} and a grant-in-aid for Scientific Research on Innovative Area (20106002) from the MEXT.",

year = "2013",

month = mar,

doi = "10.1038/pj.2012.133",

language = "English",

volume = "45",

pages = "307--312",

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T1 - Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

AU - Shinohara, Takamichi

AU - Shirahase, Tomoko

AU - Murakami, Daiki

AU - Hoshino, Taiki

AU - Kikuchi, Moriya

AU - Koike, Jun Ichiro

AU - Horigome, Misao

AU - Masunaga, Hiroyasu

AU - Ogawa, Hiroki

AU - Takahara, Atsushi

N1 - Funding Information: The synchrotron radiation SAXS measurements were performed at SPring-8 with the approval of the Japan Synchrotron Radiation Institute (JASRI, proposal number 2010A7241). The present work is supported by a grant-in-aid for the Global COE Program, ‘Science for Future Molecular Systems’ and a grant-in-aid for Scientific Research on Innovative Area (20106002) from the MEXT.

PY - 2013/3

Y1 - 2013/3

N2 - Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

AB - Nanoimprint lithography (NIL) is a simple and high-resolution patterning method. Nanoimprinted structures can be fabricated not only as surface structures but also as 'buried' structures for applications such as electro-optical devices. However, a precise and nondestructive evaluation method for nanoimprinted structures has not yet been established. Synchrotron radiation ultra-small angle X-ray scattering (SR-USAXS) is a nondestructive and high-resolution characterization method. In this study, we fabricated nanostructures on a poly(lactic acid) (PLA) film using NIL. In addition, the nanoimprinted PLA film was covered with a polystyrene thin film to fabricate a 'buried' structure. The fabricated surface and the 'buried' structure were evaluated using SR-USAXS. The scattering pattern was clearly obtained from the surface and the 'buried' structure. The size of the 'buried' structure, which was estimated from the diffraction pattern, was in good agreement with that of the surface structure. These results indicate that SR-USAXS is powerful tool for the nondestructive and precise characterization of surface and 'buried' structures.

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Precise and nondestructive characterization of a 'buried' nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

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