Precise characterization of outermost surface of crystalline-crystalline diblock copolymer thin films using synchrotron radiation soft X-ray photoelectron spectroscopy

Shiki Nojima, Takamichi Shinohara, Yuji Higaki, Ryohei Ishige, Tomoyuki Ohishi, Daigo Kobayashi, Hiroyuki Setoyama, Atsushi Takahara

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Conducting a spatially resolved chemical analysis of polymer thin film surfaces is therefore of great interest. Angle-resolved X-ray photoelectron spectroscopy has been used extensively to obtain depth profiles of the chemical composition near the polymer surface. The analytical depth depends on the photoelectron take-off angle with respect to the thin film surface, and the photoelectron take-off angle must be very low for an outermost surface analysis. The confined geometry of the PEG phase inhibits lamellar growth, which results in a decrease in crystallite size and crystalline perfection and thereby depresses the melting temperature of the PEG phase. The confined geometry of the PEG phase inhibits lamellar growth, which results in a decrease in crystallite size and crystalline perfection and thereby depresses the melting temperature of the PEG phase.

Original languageEnglish
Pages (from-to)637-640
Number of pages4
JournalPolymer Journal
Volume46
Issue number10
DOIs
Publication statusPublished - Jan 1 2014

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Synchrotron radiation
Polyethylene glycols
Block copolymers
X ray photoelectron spectroscopy
Crystalline materials
Thin films
Takeoff
Crystallite size
Photoelectrons
Melting point
Geometry
Surface analysis
Chemical analysis
Polymer films
Polymers

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Precise characterization of outermost surface of crystalline-crystalline diblock copolymer thin films using synchrotron radiation soft X-ray photoelectron spectroscopy. / Nojima, Shiki; Shinohara, Takamichi; Higaki, Yuji; Ishige, Ryohei; Ohishi, Tomoyuki; Kobayashi, Daigo; Setoyama, Hiroyuki; Takahara, Atsushi.

In: Polymer Journal, Vol. 46, No. 10, 01.01.2014, p. 637-640.

Research output: Contribution to journalArticle

Nojima, Shiki ; Shinohara, Takamichi ; Higaki, Yuji ; Ishige, Ryohei ; Ohishi, Tomoyuki ; Kobayashi, Daigo ; Setoyama, Hiroyuki ; Takahara, Atsushi. / Precise characterization of outermost surface of crystalline-crystalline diblock copolymer thin films using synchrotron radiation soft X-ray photoelectron spectroscopy. In: Polymer Journal. 2014 ; Vol. 46, No. 10. pp. 637-640.
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