Precise characterization of outermost surface of crystalline-crystalline diblock copolymer thin films using synchrotron radiation soft X-ray photoelectron spectroscopy

Shiki Nojima, Takamichi Shinohara, Yuji Higaki, Ryohei Ishige, Tomoyuki Ohishi, Daigo Kobayashi, Hiroyuki Setoyama, Atsushi Takahara

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Conducting a spatially resolved chemical analysis of polymer thin film surfaces is therefore of great interest. Angle-resolved X-ray photoelectron spectroscopy has been used extensively to obtain depth profiles of the chemical composition near the polymer surface. The analytical depth depends on the photoelectron take-off angle with respect to the thin film surface, and the photoelectron take-off angle must be very low for an outermost surface analysis. The confined geometry of the PEG phase inhibits lamellar growth, which results in a decrease in crystallite size and crystalline perfection and thereby depresses the melting temperature of the PEG phase. The confined geometry of the PEG phase inhibits lamellar growth, which results in a decrease in crystallite size and crystalline perfection and thereby depresses the melting temperature of the PEG phase.

Original languageEnglish
Pages (from-to)637-640
Number of pages4
JournalPolymer Journal
Volume46
Issue number10
DOIs
Publication statusPublished - Jan 1 2014

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Precise characterization of outermost surface of crystalline-crystalline diblock copolymer thin films using synchrotron radiation soft X-ray photoelectron spectroscopy'. Together they form a unique fingerprint.

  • Cite this