TY - JOUR
T1 - Preparation of Er2O3 and TiO2 Multilayer Films as Optical Filter Using Magnetron Sputtering Deposition
AU - Kawasaki, Hiroharu
AU - Suda, Yoshiaki
AU - Ohshima, Tamiko
AU - Yagyu, Yoshihito
AU - Ihara, Takeshi
N1 - Publisher Copyright:
© 1973-2012 IEEE.
Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 2016/12
Y1 - 2016/12
N2 - Dispersion relations of refractive indexes and extinction coefficients of constituent materials were obtained by comparing the experimental and simulated transmission spectra of single-layer Er2O3 and TiO2 films. We designed multilayer thin films of [Er2O3/TiO2]6/[Er2 O3]2/[TiO2/Er2O3]6 such that they can act as photonic crystals exhibiting a resonance wavelength of 514 nm. We prepared single-layer TiO2 and Er2O3 thin films on quartz glass substrates by employing a magnetron sputtering deposition method. Uniform films exhibiting very high transmittance values were obtained. Deposition rates of the TiO2 and Er2O3 films were 0.44 and 0.82 nm/s, respectively. [Er2O3/TiO2]6/[Er2 O3]2/[TiO2/Er2O3]6 multilayer films, to be used for optical bandpass filter applications, were also prepared using a multitarget sputtering deposition method. Uniform and transparent films were obtained; however, the wavelength corresponding to the highest transmittance was observed around 490 nm through ultraviolet-visible near-infrared spectroscopic measurements. The shift in the wavelength can be attributed to the low crystallinity and variations in the thicknesses of Er2O3 and TiO2 films.
AB - Dispersion relations of refractive indexes and extinction coefficients of constituent materials were obtained by comparing the experimental and simulated transmission spectra of single-layer Er2O3 and TiO2 films. We designed multilayer thin films of [Er2O3/TiO2]6/[Er2 O3]2/[TiO2/Er2O3]6 such that they can act as photonic crystals exhibiting a resonance wavelength of 514 nm. We prepared single-layer TiO2 and Er2O3 thin films on quartz glass substrates by employing a magnetron sputtering deposition method. Uniform films exhibiting very high transmittance values were obtained. Deposition rates of the TiO2 and Er2O3 films were 0.44 and 0.82 nm/s, respectively. [Er2O3/TiO2]6/[Er2 O3]2/[TiO2/Er2O3]6 multilayer films, to be used for optical bandpass filter applications, were also prepared using a multitarget sputtering deposition method. Uniform and transparent films were obtained; however, the wavelength corresponding to the highest transmittance was observed around 490 nm through ultraviolet-visible near-infrared spectroscopic measurements. The shift in the wavelength can be attributed to the low crystallinity and variations in the thicknesses of Er2O3 and TiO2 films.
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U2 - 10.1109/TPS.2016.2575864
DO - 10.1109/TPS.2016.2575864
M3 - Article
AN - SCOPUS:84974782777
VL - 44
SP - 3066
EP - 3070
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
SN - 0093-3813
IS - 12
M1 - 7490413
ER -