Preparation of high quality nitrogen doped TiO2 thin film as a photocatalyst using a pulsed laser deposition method

Yoshiaki Suda, Hiroharu Kawasaki, Tsuyoshi Ueda, Tamiko Ohshima

Research output: Contribution to journalConference articlepeer-review

180 Citations (Scopus)

Abstract

Nitrogen doped titanium oxide (TiO2-xNx) photocatalysts, which were reported to be activated by visible light irradiation as well as ultraviolet irradiation, have been prepared by pulsed laser deposition (PLD) method using TiN target in nitrogen/oxygen gas mixture. Crystalline structure, nitrogen states in the lattice, composition and surface morphology were analyzed by using X-ray diffraction, X-ray photoelectron spectroscopy and atomic force microscopy. As the results, it is found that film structure and properties strongly depend on target material and nitrogen concentration ratio in the gas mixture. The materials show anatase structure with nitrogen doped into TiO2 oxygen sites, which leads to band gap narrowing.

Original languageEnglish
Pages (from-to)162-166
Number of pages5
JournalThin Solid Films
Volume453-454
DOIs
Publication statusPublished - Apr 1 2004
Externally publishedYes
EventProceedings of Symposium H on Photonic Processing of Surfaces - Strasbourg, France
Duration: Jun 10 2003Jun 13 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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