Preparation of KTiOPO4 thin films on different substrates by pulsed laser deposition

Nilesh J. Vasa, Yasunari Hata, Tsuyoshi Yoshitake, Shigeru Yokoyama

    Research output: Contribution to journalArticle

    5 Citations (Scopus)

    Abstract

    Pulsed laser deposition (PLD) technique is applied in fabrication of thin films of KTiOPO4 (KTP) material, which possesses electro-optic and nonlinear optical properties. Thin film fabrication of optically functional KTP on fused silica and different sapphire substrates by changing an ambient oxygen pressure and a substrate temperature during PLD is investigated. Highly oriented KTP thin films could be grown on sapphire (112̄0)in an oxygen atmosphere by PLD using a composite target whose stoichiometry is nearly same as KTP. Although the film contained polycrystalline crystallites, predominant crystallites seemed to be epitaxially grown.

    Original languageEnglish
    Pages (from-to)600-604
    Number of pages5
    JournalInternational Journal of Advanced Manufacturing Technology
    Volume38
    Issue number5-6
    DOIs
    Publication statusPublished - Aug 1 2008

    All Science Journal Classification (ASJC) codes

    • Control and Systems Engineering
    • Software
    • Mechanical Engineering
    • Computer Science Applications
    • Industrial and Manufacturing Engineering

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