Preparation of nitrogen-doped titanium oxide thin film using a PLD method as parameters of target material and nitrogen concentration ratio in nitrogen/oxygen gas mixture

Yoshiaki Suda, Hiroharu Kawasaki, Tsuyoshi Ueda, Tamiko Ohshima

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75 Citations (Scopus)

Abstract

Nitrogen-doped titanium oxide photocatalysts, which were reported to be activated by visible light irradiation as well as ultraviolet irradiation, have been prepared by pulsed laser deposition method using Ti, TiO, TiO2 and TiN targets in nitrogen/oxygen gas mixture. As a result, it is found that film properties such as color, crystalline structure and atomic composition rate strongly depend on the target material and nitrogen concentration ratio in the gas mixture. It is also suggested that these films under UV light irradiation exhibit almost the same decomposition ability of methylene blue. However, the photocatalytic activity of the nitrogen-doped TiO2 film prepared using TiN target is higher than that of the other films prepared by Ti, TiO and TiO2 targets under normal fluorescent light irradiation.

Original languageEnglish
Pages (from-to)337-341
Number of pages5
JournalThin Solid Films
Volume475
Issue number1-2 SPEC. ISS.
DOIs
Publication statusPublished - Mar 22 2005
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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