Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

Junhui He, Shigenori Fujikawa, Toyoki Kunitake, Aiko Nakao

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

Original languageEnglish
Pages (from-to)3308-3313
Number of pages6
JournalChemistry of Materials
Volume15
Issue number17
DOIs
Publication statusPublished - Aug 1 2003
Externally publishedYes

Fingerprint

Silicon Dioxide
Calcination
Silicates
Ultrathin films
Silica
Sodium
Plasmas
Adsorption
Capsules
Film thickness
Polymers
Surface roughness
Thin films
Coatings
Catalysts
sodium silicate

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Cite this

Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate. / He, Junhui; Fujikawa, Shigenori; Kunitake, Toyoki; Nakao, Aiko.

In: Chemistry of Materials, Vol. 15, No. 17, 01.08.2003, p. 3308-3313.

Research output: Contribution to journalArticle

He, Junhui ; Fujikawa, Shigenori ; Kunitake, Toyoki ; Nakao, Aiko. / Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate. In: Chemistry of Materials. 2003 ; Vol. 15, No. 17. pp. 3308-3313.
@article{34c515193fc94a2685aa069638826f05,
title = "Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate",
abstract = "Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.",
author = "Junhui He and Shigenori Fujikawa and Toyoki Kunitake and Aiko Nakao",
year = "2003",
month = "8",
day = "1",
doi = "10.1021/cm034253d",
language = "English",
volume = "15",
pages = "3308--3313",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "17",

}

TY - JOUR

T1 - Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

AU - He, Junhui

AU - Fujikawa, Shigenori

AU - Kunitake, Toyoki

AU - Nakao, Aiko

PY - 2003/8/1

Y1 - 2003/8/1

N2 - Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

AB - Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

UR - http://www.scopus.com/inward/record.url?scp=0041922404&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0041922404&partnerID=8YFLogxK

U2 - 10.1021/cm034253d

DO - 10.1021/cm034253d

M3 - Article

AN - SCOPUS:0041922404

VL - 15

SP - 3308

EP - 3313

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 17

ER -