Preparation of ZnO thin films on various substrates by pulsed laser deposition

T. Ohshima, R. K. Thareja, T. Ikegami, K. Ebihara

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45 Citations (Scopus)

Abstract

The structural and optical properties of ZnO thin films deposited on Si (1 0 0), silica glass, α-Al2O3 (0 0 0 1) and Corning 7059 glass substrates by pulsed laser deposition have been studied. We have investigated the dependence of film properties on deposition conditions such as an ambient oxygen gas pressure (PO2) and a substrate temperature (Ts). XRD, AFM and photoluminescence (PL) measurements were used to characterize the grown films. The ZnO thin films deposited on various substrates under optimized condition of PO2 = 0.67 Pa and Ts = 550 °C were highly c-axis (0 0 2) orientated. The ZnO thin film deposited on α-Al2O3 (0 0 0 1) substrate under optimal condition emitted ultra-violet PL at approximately 395 nm by optically pumped excitation (355 nm) at a power of 466 kW/cm2.

Original languageEnglish
Pages (from-to)517-520
Number of pages4
JournalSurface and Coatings Technology
Volume169-170
DOIs
Publication statusPublished - Jun 2 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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