Preparation under high humidity conditions of nanoporous polymer film with 80 nm minimum pore size

Takatoshi Nishio, Makoto Kashiwagi, Koji Miyazaki, Masayuki Yahiro, Chihaya Adachi

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Nanoporous polymer film with the smallest pore size of 80 nm was obtained from 0.2 wt % polystyrene/dichloromethane solution at 4°C by the dip-coating method in conjunction with an evaporative humidifier. Fabrication parameters affecting the pore size such as wet coating thickness, solution temperature, and nozzle-substrate gap were varied. The distance between pores depends on the nozzle-substrate gap. For fabrication of the nanosized pores, an appropriate drying time prevents the water droplets from coalescing. Formation of the nanoporous surface structure in the films depends on the solution concentration and solution temperature preventing too rapid drying.

Original languageEnglish
Article number025201
JournalApplied Physics Express
Volume3
Issue number2
DOIs
Publication statusPublished - Feb 1 2010

Fingerprint

Polymer films
Pore size
humidity
Atmospheric humidity
porosity
preparation
polymers
drying
nozzles
Nozzles
Drying
Fabrication
Coatings
fabrication
Dichloromethane
Substrates
Surface structure
coalescing
coating
Polystyrenes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Preparation under high humidity conditions of nanoporous polymer film with 80 nm minimum pore size. / Nishio, Takatoshi; Kashiwagi, Makoto; Miyazaki, Koji; Yahiro, Masayuki; Adachi, Chihaya.

In: Applied Physics Express, Vol. 3, No. 2, 025201, 01.02.2010.

Research output: Contribution to journalArticle

Nishio, Takatoshi ; Kashiwagi, Makoto ; Miyazaki, Koji ; Yahiro, Masayuki ; Adachi, Chihaya. / Preparation under high humidity conditions of nanoporous polymer film with 80 nm minimum pore size. In: Applied Physics Express. 2010 ; Vol. 3, No. 2.
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