Production of a large diameter electron cyclotron resonance plasma using a multislot antenna for plasma application

Yoko Ueda, Masayoshi Tanaka, Shunjiro Shinohara, Yoshinobu Kawai

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    An electron cyclotron resonance plasma with large diameter, uniform, and high electron density is produced using a multislot antenna. The uniformity of the plasma is within 5% over 20 cm in diameter. The electron density of the helium plasma in front of a substrate is 7×1010 cm -3, while the electron density without the substrate is higher than the cutoff density for 2.45 GHz. The effect of the magnetic field configuration on plasma uniformity is investigated. Both of the R wave (electron cyclotron wave) and L wave are found to be excited in the plasma.

    Original languageEnglish
    Pages (from-to)5423-5427
    Number of pages5
    JournalReview of Scientific Instruments
    Issue number12
    Publication statusPublished - Dec 1 1995


    All Science Journal Classification (ASJC) codes

    • Instrumentation

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