Production of electron cyclotron resonance plasma for uniform deposition using a TE01 mode microwave

Ryota Hidaka, Toru Yamaguchi, Akihisa Tsuruta, Masayoshi Tanaka, Yoshinobu Kawai

    Research output: Contribution to journalArticle

    3 Citations (Scopus)

    Abstract

    An electron cyclotron resonance (ECR) plasma is produced at pressures up to 10 mTorr with a circular TE01 mode microwave. The plasma density is almost radially uniform even at 10 mTorr. SiC films are formed on silicon wafers by introducing methane gas into the ECR plasma. It is shown that a circular TE01 mode microwave is useful for the ECR plasma chemical vapor deposition (CVD).

    Original languageEnglish
    Pages (from-to)1590-1593
    Number of pages4
    JournalReview of Scientific Instruments
    Volume65
    Issue number5
    DOIs
    Publication statusPublished - Dec 1 1994

    All Science Journal Classification (ASJC) codes

    • Instrumentation

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