Production of low electron temperature ECR plasma for plasma processing

Naho Itagaki; Yoko Ueda; Nobuo Ishii; Yoshinobu Kawai

doi:10.1016/S0040-6090(01)00920-8

Production of low electron temperature ECR plasma for plasma processing

Naho Itagaki, Yoko Ueda, Nobuo Ishii, Yoshinobu Kawai

Department of I&E Visionaries

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Low-electron-temperature ECR plasma with high electron density was realized under the mirror magnetic field configuration in the H₂ and the Ar/N₂ plasma. Especially, the electron temperature was observed to be less than 2 eV in the Ar/N₂ plasma. It was found from the calculation of particle and power balance in steady state that the decrease in the electron temperature observed in the Ar/N₂ plasma was due to the effect of the magnetic-mirror confinement of the N₂ plasma. Furthermore, our calculated results suggest that the effect of magnetic-mirror on the decrease in the electron temperature depends on the collisional cross section between electrons and neutral particles.

Original language	English
Pages (from-to)	202-207
Number of pages	6
Journal	Thin Solid Films
Volume	390
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(01)00920-8
Publication status	Published - Jun 30 2001

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(01)00920-8

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title = "Production of low electron temperature ECR plasma for plasma processing",

abstract = "Low-electron-temperature ECR plasma with high electron density was realized under the mirror magnetic field configuration in the H2 and the Ar/N2 plasma. Especially, the electron temperature was observed to be less than 2 eV in the Ar/N2 plasma. It was found from the calculation of particle and power balance in steady state that the decrease in the electron temperature observed in the Ar/N2 plasma was due to the effect of the magnetic-mirror confinement of the N2 plasma. Furthermore, our calculated results suggest that the effect of magnetic-mirror on the decrease in the electron temperature depends on the collisional cross section between electrons and neutral particles.",

author = "Naho Itagaki and Yoko Ueda and Nobuo Ishii and Yoshinobu Kawai",

year = "2001",

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T1 - Production of low electron temperature ECR plasma for plasma processing

AU - Itagaki, Naho

AU - Ueda, Yoko

AU - Ishii, Nobuo

AU - Kawai, Yoshinobu

PY - 2001/6/30

Y1 - 2001/6/30

N2 - Low-electron-temperature ECR plasma with high electron density was realized under the mirror magnetic field configuration in the H2 and the Ar/N2 plasma. Especially, the electron temperature was observed to be less than 2 eV in the Ar/N2 plasma. It was found from the calculation of particle and power balance in steady state that the decrease in the electron temperature observed in the Ar/N2 plasma was due to the effect of the magnetic-mirror confinement of the N2 plasma. Furthermore, our calculated results suggest that the effect of magnetic-mirror on the decrease in the electron temperature depends on the collisional cross section between electrons and neutral particles.

AB - Low-electron-temperature ECR plasma with high electron density was realized under the mirror magnetic field configuration in the H2 and the Ar/N2 plasma. Especially, the electron temperature was observed to be less than 2 eV in the Ar/N2 plasma. It was found from the calculation of particle and power balance in steady state that the decrease in the electron temperature observed in the Ar/N2 plasma was due to the effect of the magnetic-mirror confinement of the N2 plasma. Furthermore, our calculated results suggest that the effect of magnetic-mirror on the decrease in the electron temperature depends on the collisional cross section between electrons and neutral particles.

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EP - 207

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -

Production of low electron temperature ECR plasma for plasma processing

Abstract

All Science Journal Classification (ASJC) codes

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