Production of low electron temperature ECR plasma for plasma processing

Naho Itagaki, Yoko Ueda, Nobuo Ishii, Yoshinobu Kawai

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Low-electron-temperature ECR plasma with high electron density was realized under the mirror magnetic field configuration in the H2 and the Ar/N2 plasma. Especially, the electron temperature was observed to be less than 2 eV in the Ar/N2 plasma. It was found from the calculation of particle and power balance in steady state that the decrease in the electron temperature observed in the Ar/N2 plasma was due to the effect of the magnetic-mirror confinement of the N2 plasma. Furthermore, our calculated results suggest that the effect of magnetic-mirror on the decrease in the electron temperature depends on the collisional cross section between electrons and neutral particles.

Original languageEnglish
Pages (from-to)202-207
Number of pages6
JournalThin Solid Films
Volume390
Issue number1-2
DOIs
Publication statusPublished - Jun 30 2001

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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