Production of low electron temperature ECR plasma for thin film deposition

Naho Itagaki, Yoko Ueda, Nobuo Ishii, Yoshinobu Kawai

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8 Citations (Scopus)

Abstract

An electron cyclotron resonance (ECR) plasma with low electron temperature parallel to the magnetic field was produced by applying the mirror magnetic field for Ar, Ar/N2 and H2 gasses. It was found that the temperature parallel to the magnetic field was lower than the temperature perpendicular to the field by 5 ∼ 50% and decreased at the 'throat' of the mirror magnetic field. Especially, the electron temperature parallel to the magnetic field was observed to be less than 2 eV in the Ar/N2 and the H2 plasma. Our experimental results suggested that the high-quality thin films could be prepared by setting the substrate perpendicular to the field lines at the 'throat' of mirror magnetic field because of the decrease in ion bombardment to the substrate.

Original languageEnglish
Pages (from-to)546-550
Number of pages5
JournalSurface and Coatings Technology
Volume142-144
DOIs
Publication statusPublished - Jul 1 2001

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All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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