Production of size-controlled Si fine particles using pulsed RF discharge

Masaharu Shiratani, H. Kawasaki, T. Fukuzawa, Yukio Watanabe

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

We describe a new method for production of size-controlled Si fine particles that employs a pulsed RF silane discharge. Size, density, and morphology of particles prepared by this method are studied using scanning electron microscopy. Particles with a small size dispersion are produced in the size range from 10 to 120 nm and with densities above 107 cm-3. It is found that particles grow through three phases of nucleation, rapid growth, and growth saturation. Particles in two different size ranges coexist after the initiation of the rapid-growth phase above RF power of 40 W, and coagulation of particles plays a crucial role in the rapid-growth phase.

Original languageEnglish
Pages (from-to)75-78
Number of pages4
JournalSurface Review and Letters
Volume3
Issue number1
DOIs
Publication statusPublished - Jan 1 1996

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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