Production of size-controlled Si fine particles using pulsed RF discharge

Masaharu Shiratani; H. Kawasaki; T. Fukuzawa; Yukio Watanabe

doi:10.1142/S0218625X96000176

Production of size-controlled Si fine particles using pulsed RF discharge

Masaharu Shiratani, H. Kawasaki, T. Fukuzawa, Yukio Watanabe

Research output: Contribution to journal › Article › peer-review

Abstract

We describe a new method for production of size-controlled Si fine particles that employs a pulsed RF silane discharge. Size, density, and morphology of particles prepared by this method are studied using scanning electron microscopy. Particles with a small size dispersion are produced in the size range from 10 to 120 nm and with densities above 10⁷ cm^-3. It is found that particles grow through three phases of nucleation, rapid growth, and growth saturation. Particles in two different size ranges coexist after the initiation of the rapid-growth phase above RF power of 40 W, and coagulation of particles plays a crucial role in the rapid-growth phase.

Original language	English
Pages (from-to)	75-78
Number of pages	4
Journal	Surface Review and Letters
Volume	3
Issue number	1
DOIs	https://doi.org/10.1142/S0218625X96000176
Publication status	Published - Jan 1 1996

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1142/S0218625X96000176

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author = "Masaharu Shiratani and H. Kawasaki and T. Fukuzawa and Yukio Watanabe",

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AU - Kawasaki, H.

AU - Fukuzawa, T.

AU - Watanabe, Yukio

PY - 1996/1/1

Y1 - 1996/1/1

N2 - We describe a new method for production of size-controlled Si fine particles that employs a pulsed RF silane discharge. Size, density, and morphology of particles prepared by this method are studied using scanning electron microscopy. Particles with a small size dispersion are produced in the size range from 10 to 120 nm and with densities above 107 cm-3. It is found that particles grow through three phases of nucleation, rapid growth, and growth saturation. Particles in two different size ranges coexist after the initiation of the rapid-growth phase above RF power of 40 W, and coagulation of particles plays a crucial role in the rapid-growth phase.

AB - We describe a new method for production of size-controlled Si fine particles that employs a pulsed RF silane discharge. Size, density, and morphology of particles prepared by this method are studied using scanning electron microscopy. Particles with a small size dispersion are produced in the size range from 10 to 120 nm and with densities above 107 cm-3. It is found that particles grow through three phases of nucleation, rapid growth, and growth saturation. Particles in two different size ranges coexist after the initiation of the rapid-growth phase above RF power of 40 W, and coagulation of particles plays a crucial role in the rapid-growth phase.

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Production of size-controlled Si fine particles using pulsed RF discharge

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All Science Journal Classification (ASJC) codes

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