TY - JOUR
T1 - Progress and perspectives in dry processes for leading-edge manufacturing of devices
T2 - Toward intelligent processes and virtual product development
AU - Iwase, Taku
AU - Kamaji, Yoshito
AU - Kang, Song Yun
AU - Koga, Kazunori
AU - Kuboi, Nobuyuki
AU - Nakamura, Moritaka
AU - Negishi, Nobuyuki
AU - Nozaki, Tomohiro
AU - Nunomura, Shota
AU - Ogawa, Daisuke
AU - Omura, Mitsuhiro
AU - Shimizu, Tetsuji
AU - Shinoda, Kazunori
AU - Sonoda, Yasushi
AU - Suzuki, Haruka
AU - Takahashi, Kazuo
AU - Tsutsumi, Takayoshi
AU - Yoshikawa, Kenichi
AU - Ishijima, Tatsuo
AU - Ishikawa, Kenji
N1 - Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019
Y1 - 2019
N2 - Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface subjected to ion bombardment. To control such processing, methods for process monitoring, equipment control, modeling and simulation, and controlling plasma-induced damage, are required. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes in regard to intelligent process-control. We also address the challenges of implementing "virtual product development" utilizing information technology.
AB - Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface subjected to ion bombardment. To control such processing, methods for process monitoring, equipment control, modeling and simulation, and controlling plasma-induced damage, are required. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes in regard to intelligent process-control. We also address the challenges of implementing "virtual product development" utilizing information technology.
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U2 - 10.7567/1347-4065/ab163b
DO - 10.7567/1347-4065/ab163b
M3 - Review article
AN - SCOPUS:85072935737
SN - 0021-4922
VL - 58
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - SE
M1 - SE0804
ER -