TY - JOUR
T1 - Properties of the nb thin-film nanobridges prepared by nanometer fabrication process
AU - Harada, Yuichi
AU - Hirose, Nobumitsu
AU - Uzawa, Yoshinori
PY - 1991/12
Y1 - 1991/12
N2 - We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.
AB - We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.
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U2 - 10.1143/JJAP.30.3933
DO - 10.1143/JJAP.30.3933
M3 - Article
AN - SCOPUS:84902271442
SN - 0021-4922
VL - 30
SP - 3933
EP - 3937
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 12
ER -