Properties of the nb thin-film nanobridges prepared by nanometer fabrication process

Yuichi Harada, Nobumitsu Hirose, Yoshinori Uzawa

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.

Original languageEnglish
Pages (from-to)3933-3937
Number of pages5
JournalJapanese Journal of Applied Physics
Volume30
Issue number12
DOIs
Publication statusPublished - Dec 1991

Fingerprint

Reactive ion etching
Nanotechnology
Electron beams
Radiation
Fabrication
Thin films
fabrication
etchants
nanofabrication
thin films
etching
electron beams
sensitivity
radiation
synthesis
ions

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Properties of the nb thin-film nanobridges prepared by nanometer fabrication process. / Harada, Yuichi; Hirose, Nobumitsu; Uzawa, Yoshinori.

In: Japanese Journal of Applied Physics, Vol. 30, No. 12, 12.1991, p. 3933-3937.

Research output: Contribution to journalArticle

Harada, Yuichi ; Hirose, Nobumitsu ; Uzawa, Yoshinori. / Properties of the nb thin-film nanobridges prepared by nanometer fabrication process. In: Japanese Journal of Applied Physics. 1991 ; Vol. 30, No. 12. pp. 3933-3937.
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