Pulsed laser ablation of silver: Ion dynamics in the plasma plume

M. Esposito, T. Lippert, C. W. Schneider, A. Wokaun, T. Donnelly, J. G. Lunney, H. Tellez, J. M. Vadillo, J. J. Laserna

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The ion dynamics of silver ablated using 355 and 193nm pulsed laser irradiation in vacuum has been investigated by usinga Langmuir probe and quadrupole mass spectrometry. The kinetic energies of the ablated silver ions were measured to be between 5 and 40 eV depending on the laser fluence. In addition, the angular distributions of ablated species showed that ionic species are preferentially ejected along the surface normal and the corresponding plasma temperature T ≈ 0.7 eV agrees well for both techniques.

Original languageEnglish
Pages (from-to)677-680
Number of pages4
JournalJournal of Optoelectronics and Advanced Materials
Volume12
Issue number3
Publication statusPublished - Mar 1 2010

Fingerprint

Laser ablation
Pulsed lasers
Silver
laser ablation
plumes
pulsed lasers
silver
Ions
Plasmas
Langmuir probes
Angular distribution
plasma temperature
Laser beam effects
electrostatic probes
Kinetic energy
Mass spectrometry
fluence
ions
mass spectroscopy
angular distribution

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Esposito, M., Lippert, T., Schneider, C. W., Wokaun, A., Donnelly, T., Lunney, J. G., ... Laserna, J. J. (2010). Pulsed laser ablation of silver: Ion dynamics in the plasma plume. Journal of Optoelectronics and Advanced Materials, 12(3), 677-680.

Pulsed laser ablation of silver : Ion dynamics in the plasma plume. / Esposito, M.; Lippert, T.; Schneider, C. W.; Wokaun, A.; Donnelly, T.; Lunney, J. G.; Tellez, H.; Vadillo, J. M.; Laserna, J. J.

In: Journal of Optoelectronics and Advanced Materials, Vol. 12, No. 3, 01.03.2010, p. 677-680.

Research output: Contribution to journalArticle

Esposito, M, Lippert, T, Schneider, CW, Wokaun, A, Donnelly, T, Lunney, JG, Tellez, H, Vadillo, JM & Laserna, JJ 2010, 'Pulsed laser ablation of silver: Ion dynamics in the plasma plume', Journal of Optoelectronics and Advanced Materials, vol. 12, no. 3, pp. 677-680.
Esposito M, Lippert T, Schneider CW, Wokaun A, Donnelly T, Lunney JG et al. Pulsed laser ablation of silver: Ion dynamics in the plasma plume. Journal of Optoelectronics and Advanced Materials. 2010 Mar 1;12(3):677-680.
Esposito, M. ; Lippert, T. ; Schneider, C. W. ; Wokaun, A. ; Donnelly, T. ; Lunney, J. G. ; Tellez, H. ; Vadillo, J. M. ; Laserna, J. J. / Pulsed laser ablation of silver : Ion dynamics in the plasma plume. In: Journal of Optoelectronics and Advanced Materials. 2010 ; Vol. 12, No. 3. pp. 677-680.
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