Pulsed laser ablation of silver: Ion dynamics in the plasma plume

M. Esposito; T. Lippert; C. W. Schneider; A. Wokaun; T. Donnelly; J. G. Lunney; H. Tellez; J. M. Vadillo; J. J. Laserna

Pulsed laser ablation of silver: Ion dynamics in the plasma plume

M. Esposito, T. Lippert, C. W. Schneider, A. Wokaun, T. Donnelly, J. G. Lunney, H. Tellez, J. M. Vadillo, J. J. Laserna

Research output: Contribution to journal › Article › peer-review

Abstract

The ion dynamics of silver ablated using 355 and 193nm pulsed laser irradiation in vacuum has been investigated by usinga Langmuir probe and quadrupole mass spectrometry. The kinetic energies of the ablated silver ions were measured to be between 5 and 40 eV depending on the laser fluence. In addition, the angular distributions of ablated species showed that ionic species are preferentially ejected along the surface normal and the corresponding plasma temperature T ≈ 0.7 eV agrees well for both techniques.

Original language	English
Pages (from-to)	677-680
Number of pages	4
Journal	Journal of Optoelectronics and Advanced Materials
Volume	12
Issue number	3
Publication status	Published - Mar 2010

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

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abstract = "The ion dynamics of silver ablated using 355 and 193nm pulsed laser irradiation in vacuum has been investigated by usinga Langmuir probe and quadrupole mass spectrometry. The kinetic energies of the ablated silver ions were measured to be between 5 and 40 eV depending on the laser fluence. In addition, the angular distributions of ablated species showed that ionic species are preferentially ejected along the surface normal and the corresponding plasma temperature T ≈ 0.7 eV agrees well for both techniques.",

author = "M. Esposito and T. Lippert and Schneider, {C. W.} and A. Wokaun and T. Donnelly and Lunney, {J. G.} and H. Tellez and Vadillo, {J. M.} and Laserna, {J. J.}",

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pages = "677--680",

journal = "Journal of Optoelectronics and Advanced Materials",

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T1 - Pulsed laser ablation of silver

T2 - Ion dynamics in the plasma plume

AU - Esposito, M.

AU - Lippert, T.

AU - Schneider, C. W.

AU - Wokaun, A.

AU - Donnelly, T.

AU - Lunney, J. G.

AU - Tellez, H.

AU - Vadillo, J. M.

AU - Laserna, J. J.

PY - 2010/3

Y1 - 2010/3

N2 - The ion dynamics of silver ablated using 355 and 193nm pulsed laser irradiation in vacuum has been investigated by usinga Langmuir probe and quadrupole mass spectrometry. The kinetic energies of the ablated silver ions were measured to be between 5 and 40 eV depending on the laser fluence. In addition, the angular distributions of ablated species showed that ionic species are preferentially ejected along the surface normal and the corresponding plasma temperature T ≈ 0.7 eV agrees well for both techniques.

AB - The ion dynamics of silver ablated using 355 and 193nm pulsed laser irradiation in vacuum has been investigated by usinga Langmuir probe and quadrupole mass spectrometry. The kinetic energies of the ablated silver ions were measured to be between 5 and 40 eV depending on the laser fluence. In addition, the angular distributions of ablated species showed that ionic species are preferentially ejected along the surface normal and the corresponding plasma temperature T ≈ 0.7 eV agrees well for both techniques.

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M3 - Article

AN - SCOPUS:77950839196

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JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

IS - 3

ER -

Pulsed laser ablation of silver: Ion dynamics in the plasma plume

Abstract

All Science Journal Classification (ASJC) codes

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