Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films

Kenji Ebihara; Pail Kyun Shin; Tamiko Ohshima; Hiroshi Kurihara; Tomoaki Ikegami; Toshihisa Yamaguchi; Takamasa Sakai

doi:10.1557/proc-771-l7.48

Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films

Kenji Ebihara, Pail Kyun Shin, Tamiko Ohshima, Hiroshi Kurihara, Tomoaki Ikegami, Toshihisa Yamaguchi, Takamasa Sakai

Research output: Contribution to journal › Conference article › peer-review

Abstract

Thin films of low molecular weight electroluminescence (EL) materials, Alq₃ (aluminum tirs-8-hydoroxyquinline), TPD (N, N′-diphenyl-N, N′-bis (3methylphenyl)-(1, 1′-biphenyle)-4, 4′-diamine) were deposited by pulsed laser ablation (PLA) method using KrF excimer laser and Nd: YAG laser. Optical absorption property, surface morphology and photoluminescence of the films were investigated. Alq₃ films by Nd:YAG laser show slight absorption at around 400 nm, and TPD films by either KrF laser or Nd:YAG laser showed absorption at 320 nm and 360 nm. It was found that TPD thin films for EL devices can be deposited by PLA method usig Nd:YAG laser.

Original language	English
Pages (from-to)	279-284
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	771
DOIs	https://doi.org/10.1557/proc-771-l7.48
Publication status	Published - 2003
Externally published	Yes
Event	Organic and Polymeric Materials and Devices - San Francisco, CA, United States Duration: Apr 22 2003 → Apr 25 2003

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-771-l7.48

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title = "Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films",

abstract = "Thin films of low molecular weight electroluminescence (EL) materials, Alq3 (aluminum tirs-8-hydoroxyquinline), TPD (N, N′-diphenyl-N, N′-bis (3methylphenyl)-(1, 1′-biphenyle)-4, 4′-diamine) were deposited by pulsed laser ablation (PLA) method using KrF excimer laser and Nd: YAG laser. Optical absorption property, surface morphology and photoluminescence of the films were investigated. Alq3 films by Nd:YAG laser show slight absorption at around 400 nm, and TPD films by either KrF laser or Nd:YAG laser showed absorption at 320 nm and 360 nm. It was found that TPD thin films for EL devices can be deposited by PLA method usig Nd:YAG laser.",

author = "Kenji Ebihara and Shin, {Pail Kyun} and Tamiko Ohshima and Hiroshi Kurihara and Tomoaki Ikegami and Toshihisa Yamaguchi and Takamasa Sakai",

year = "2003",

doi = "10.1557/proc-771-l7.48",

language = "English",

volume = "771",

pages = "279--284",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Organic and Polymeric Materials and Devices ; Conference date: 22-04-2003 Through 25-04-2003",

}

TY - JOUR

T1 - Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films

AU - Ebihara, Kenji

AU - Shin, Pail Kyun

AU - Ohshima, Tamiko

AU - Kurihara, Hiroshi

AU - Ikegami, Tomoaki

AU - Yamaguchi, Toshihisa

AU - Sakai, Takamasa

PY - 2003

Y1 - 2003

N2 - Thin films of low molecular weight electroluminescence (EL) materials, Alq3 (aluminum tirs-8-hydoroxyquinline), TPD (N, N′-diphenyl-N, N′-bis (3methylphenyl)-(1, 1′-biphenyle)-4, 4′-diamine) were deposited by pulsed laser ablation (PLA) method using KrF excimer laser and Nd: YAG laser. Optical absorption property, surface morphology and photoluminescence of the films were investigated. Alq3 films by Nd:YAG laser show slight absorption at around 400 nm, and TPD films by either KrF laser or Nd:YAG laser showed absorption at 320 nm and 360 nm. It was found that TPD thin films for EL devices can be deposited by PLA method usig Nd:YAG laser.

AB - Thin films of low molecular weight electroluminescence (EL) materials, Alq3 (aluminum tirs-8-hydoroxyquinline), TPD (N, N′-diphenyl-N, N′-bis (3methylphenyl)-(1, 1′-biphenyle)-4, 4′-diamine) were deposited by pulsed laser ablation (PLA) method using KrF excimer laser and Nd: YAG laser. Optical absorption property, surface morphology and photoluminescence of the films were investigated. Alq3 films by Nd:YAG laser show slight absorption at around 400 nm, and TPD films by either KrF laser or Nd:YAG laser showed absorption at 320 nm and 360 nm. It was found that TPD thin films for EL devices can be deposited by PLA method usig Nd:YAG laser.

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DO - 10.1557/proc-771-l7.48

M3 - Conference article

AN - SCOPUS:0242290844

SN - 0272-9172

VL - 771

SP - 279

EP - 284

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Organic and Polymeric Materials and Devices

Y2 - 22 April 2003 through 25 April 2003

ER -

Pulsed Laser Deposition of Aluminum Tris-8-hydroxyquinline and TPD Thin Films

Abstract

All Science Journal Classification (ASJC) codes

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