Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

    Original languageEnglish
    Title of host publicationConference on Lasers and Electro-Optics, CLEO 2008
    PublisherOptical Society of America
    ISBN (Print)9781557528599
    Publication statusPublished - Jan 1 2008
    EventConference on Lasers and Electro-Optics, CLEO 2008 - San Jose, CA, United States
    Duration: May 4 2008May 9 2008

    Publication series

    NameOptics InfoBase Conference Papers
    ISSN (Electronic)2162-2701

    Other

    OtherConference on Lasers and Electro-Optics, CLEO 2008
    CountryUnited States
    CitySan Jose, CA
    Period5/4/085/9/08

    All Science Journal Classification (ASJC) codes

    • Instrumentation
    • Atomic and Molecular Physics, and Optics

    Fingerprint Dive into the research topics of 'Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing'. Together they form a unique fingerprint.

    Cite this