Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

T. Yatsui; W. Nomura; M. Ohtsu; K. Hirata; Y. Tabata

Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R_a, and the dispersion of R_a.

Original language	English
Title of host publication	Conference on Lasers and Electro-Optics, CLEO 2008
Publisher	Optical Society of America
ISBN (Print)	9781557528599
Publication status	Published - Jan 1 2008
Event	Conference on Lasers and Electro-Optics, CLEO 2008 - San Jose, CA, United States Duration: May 4 2008 → May 9 2008

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Conference on Lasers and Electro-Optics, CLEO 2008
Country/Territory	United States
City	San Jose, CA
Period	5/4/08 → 5/9/08

All Science Journal Classification (ASJC) codes

Instrumentation
Atomic and Molecular Physics, and Optics

Cite this

Yatsui, T, Nomura, W, Ohtsu, M, Hirata, K & Tabata, Y 2008, Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. in Conference on Lasers and Electro-Optics, CLEO 2008. Optics InfoBase Conference Papers, Optical Society of America, Conference on Lasers and Electro-Optics, CLEO 2008, San Jose, CA, United States, 5/4/08.

@inproceedings{502d754569b94ecba7bc64723f253f09,

title = "Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing",

abstract = "We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.",

author = "T. Yatsui and W. Nomura and M. Ohtsu and K. Hirata and Y. Tabata",

year = "2008",

month = jan,

day = "1",

language = "English",

isbn = "9781557528599",

series = "Optics InfoBase Conference Papers",

publisher = "Optical Society of America",

booktitle = "Conference on Lasers and Electro-Optics, CLEO 2008",

note = "Conference on Lasers and Electro-Optics, CLEO 2008 ; Conference date: 04-05-2008 Through 09-05-2008",

}

TY - GEN

T1 - Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

AU - Yatsui, T.

AU - Nomura, W.

AU - Ohtsu, M.

AU - Hirata, K.

AU - Tabata, Y.

PY - 2008/1/1

Y1 - 2008/1/1

N2 - We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

AB - We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

UR - http://www.scopus.com/inward/record.url?scp=84898640582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84898640582&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84898640582

SN - 9781557528599

T3 - Optics InfoBase Conference Papers

BT - Conference on Lasers and Electro-Optics, CLEO 2008

PB - Optical Society of America

T2 - Conference on Lasers and Electro-Optics, CLEO 2008

Y2 - 4 May 2008 through 9 May 2008

ER -

Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

Abstract

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All Science Journal Classification (ASJC) codes

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