Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2008
PublisherOptical Society of America
ISBN (Print)9781557528599
Publication statusPublished - Jan 1 2008
EventConference on Lasers and Electro-Optics, CLEO 2008 - San Jose, CA, United States
Duration: May 4 2008May 9 2008

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherConference on Lasers and Electro-Optics, CLEO 2008
CountryUnited States
CitySan Jose, CA
Period5/4/085/9/08

Fingerprint

Nanophotonics
Photochemical reactions
Polishing
polishing
photochemical reactions
surface roughness
roughness
Surface roughness
Silica
silicon dioxide
Substrates

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Yatsui, T., Nomura, W., Ohtsu, M., Hirata, K., & Tabata, Y. (2008). Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. In Conference on Lasers and Electro-Optics, CLEO 2008 (Optics InfoBase Conference Papers). Optical Society of America.

Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. / Yatsui, T.; Nomura, W.; Ohtsu, M.; Hirata, K.; Tabata, Y.

Conference on Lasers and Electro-Optics, CLEO 2008. Optical Society of America, 2008. (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yatsui, T, Nomura, W, Ohtsu, M, Hirata, K & Tabata, Y 2008, Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. in Conference on Lasers and Electro-Optics, CLEO 2008. Optics InfoBase Conference Papers, Optical Society of America, Conference on Lasers and Electro-Optics, CLEO 2008, San Jose, CA, United States, 5/4/08.
Yatsui T, Nomura W, Ohtsu M, Hirata K, Tabata Y. Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. In Conference on Lasers and Electro-Optics, CLEO 2008. Optical Society of America. 2008. (Optics InfoBase Conference Papers).
Yatsui, T. ; Nomura, W. ; Ohtsu, M. ; Hirata, K. ; Tabata, Y. / Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing. Conference on Lasers and Electro-Optics, CLEO 2008. Optical Society of America, 2008. (Optics InfoBase Conference Papers).
@inproceedings{502d754569b94ecba7bc64723f253f09,
title = "Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing",
abstract = "We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.",
author = "T. Yatsui and W. Nomura and M. Ohtsu and K. Hirata and Y. Tabata",
year = "2008",
month = "1",
day = "1",
language = "English",
isbn = "9781557528599",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America",
booktitle = "Conference on Lasers and Electro-Optics, CLEO 2008",

}

TY - GEN

T1 - Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

AU - Yatsui, T.

AU - Nomura, W.

AU - Ohtsu, M.

AU - Hirata, K.

AU - Tabata, Y.

PY - 2008/1/1

Y1 - 2008/1/1

N2 - We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

AB - We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.

UR - http://www.scopus.com/inward/record.url?scp=84898640582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84898640582&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84898640582

SN - 9781557528599

T3 - Optics InfoBase Conference Papers

BT - Conference on Lasers and Electro-Optics, CLEO 2008

PB - Optical Society of America

ER -