Realization of ultraflat plastic film using dressed-photon-phonon-assisted selective etching of nanoscale structures

Takashi Yatsui, Wataru Nomura, Motoichi Ohtsu

    Research output: Contribution to journalArticle

    3 Citations (Scopus)

    Abstract

    We compared dressed-photon-phonon (DPP) etching to conventional photochemical etching and, using a numerical analysis of topographic images of the resultant etched polymethyl methacrylate (PMMA) substrate, we determined that the DPP etching resulted in the selective etching of smaller scale structures in comparison with the conventional photochemical etching. We investigated the wavelength dependence of the PMMA substrate etching using an Ogas. As the dissociation energy of Ois 5.12 eV, we applied a continuous-wave (CW) He-Cd laser (λ= 325 nm, 3.81 eV) for the DPP etching and a 5th-harmonic Nd:YAG laser (λ= 213 nm, 5.82 eV) for the conventional photochemical etching. From the obtained atomic force microscope images, we confirmed a reduction in surface roughness, Ra, in both cases. However, based on calculations involving the standard deviation of the height difference function, we confirmed that the conventional photochemical etching method etched the larger scale structures only, while the DPP etching process selectively etched the smaller scale features.

    Original languageEnglish
    Article number701802
    JournalAdvances in Optical Technologies
    Volume2015
    DOIs
    Publication statusPublished - Jan 1 2015

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics

    Fingerprint Dive into the research topics of 'Realization of ultraflat plastic film using dressed-photon-phonon-assisted selective etching of nanoscale structures'. Together they form a unique fingerprint.

  • Cite this