Realization of ultraflat plastic film using dressed-photon-phonon-assisted selective etching of nanoscale structures

Takashi Yatsui, Wataru Nomura, Motoichi Ohtsu

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We compared dressed-photon-phonon (DPP) etching to conventional photochemical etching and, using a numerical analysis of topographic images of the resultant etched polymethyl methacrylate (PMMA) substrate, we determined that the DPP etching resulted in the selective etching of smaller scale structures in comparison with the conventional photochemical etching. We investigated the wavelength dependence of the PMMA substrate etching using an Ogas. As the dissociation energy of Ois 5.12 eV, we applied a continuous-wave (CW) He-Cd laser (λ= 325 nm, 3.81 eV) for the DPP etching and a 5th-harmonic Nd:YAG laser (λ= 213 nm, 5.82 eV) for the conventional photochemical etching. From the obtained atomic force microscope images, we confirmed a reduction in surface roughness, Ra, in both cases. However, based on calculations involving the standard deviation of the height difference function, we confirmed that the conventional photochemical etching method etched the larger scale structures only, while the DPP etching process selectively etched the smaller scale features.

Original languageEnglish
Article number701802
JournalAdvances in Optical Technologies
Volume2015
DOIs
Publication statusPublished - Jan 1 2015

Fingerprint

Plastic films
polymeric films
Etching
Photons
etching
photons
Polymethyl Methacrylate
Polymethyl methacrylates
polymethyl methacrylate
Lasers
Substrates
numerical analysis
continuous radiation
YAG lasers
Numerical analysis
standard deviation
surface roughness
Microscopes
Surface roughness
microscopes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Realization of ultraflat plastic film using dressed-photon-phonon-assisted selective etching of nanoscale structures. / Yatsui, Takashi; Nomura, Wataru; Ohtsu, Motoichi.

In: Advances in Optical Technologies, Vol. 2015, 701802, 01.01.2015.

Research output: Contribution to journalArticle

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