Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Yuanlu Tsai, Zhiteng Li, Shaojie Hu

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer deposition (ALD) and atomic layer etching (ALE). To begin, we introduce the main atomic layer deposition techniques. Then, in a brief review, we discuss ALE technology for insulators, semiconductors, metals, and newly created two-dimensional van der Waals materials. Additionally, we compare the critical factors learned from ALD to constructing ALE technology. Finally, we discuss the future prospects and challenges of atomic layer technology in the field of spinronics.

Original languageEnglish
Article number661
JournalNanomaterials
Volume12
Issue number4
DOIs
Publication statusPublished - Feb 1 2022
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)

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